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2006
(P-06-1) Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates
Zhaohui H. Yang and James R. Leger
Opt. Eng. 45, 043401 (2006)
(P-06-2) Exposure of Thick Polymethylglutarimide Films for Structural MEMS
Ian G. Foulds, Robert W. Johnstone, See-Ho H. Tsang, and M (Ash) Parameswaran
ECS Trans. 3, (10) 299 (2006)
(P-06-3) Robust shadow-mask evaporation via lithographically controlled undercut
B. Cord, C. Dames, K. K. Berggren, and J. Aumentado
J. Vac. Sci. Technol. B 24, 3139 (2006)
(P-06-4) Effect of cold development on improvement in electron-beam nanopatterning resolution and line roughness
L. E. Ocola and A. Stein
J. Vac. Sci. Technol. B 24, 3061 (2006)
(P-06-5) Megasonic-assisted development of nanostructures
David Küpper, Daniel Küpper, Thorsten Wahlbrink, Jens Bolten, Max C. Lemme, Yordan M. Georgiev, and Heinrich Kurz
J. Vac. Sci. Technol. B 24, 1827 (2006)
(P-06-6) Fabrication of metallic air bridges using multiple-dose electron beam lithography
E. Girgis, J. Liu, and M. L. Benkhedar
Appl. Phys. Lett. 88, 202103 (2006)
(P-06-7) Effects of low-voltage electron beam lithography
Mehdi Bolorizadeh and David C. Joy
Proc. SPIE 6151, 61512C (2006)
(P-06-8) Simulation of the spatial distribution and molecular weight of polymethylmethacrylate fragments in electron beam lithography exposures
M. Aktary, M. Stepanova, and S. K. Dew
J. Vac. Sci. Technol. B 24, 768 (2006)
2005
(P-05-1) Fabrication of 30nm T-gate High Electron Mobility Transistors Using a Bi-layer of PMMA and UVIII
E. Boyd*, H. Zhou, H. McLelland, D.A.J. Moran, S. Thoms and I.G. Thayne
IEEE 2005
(P-05-2) Sub-50 nm T-gate pseudomorphic HEMTs using low temperature development method
Kang-Sung Lee, Kyung-Taek Lee, Young-Su Kim, and Yoon-Ha Jeong
Dept of EE Pohang Univ of Sci and Tech (POSTECH) (NCNT), Pohang, Kyungbuk, RoK
Proceedings of 2005 5th IEEE Conf on Nanotech, Nagoya, Japan and Paper No. TH-P2-4, Jul., 11-15 2005
(P-05-3) Process control of photoresist undercut for lift-off patterns below 100 nm
Chao-Peng Chen, Jei-Wei Chang, Rina Kaji, and Hromichi Kawasaki
Proc. SPIE 5751, 601 (2005)
(P-05-4) A novel low-temperature method to fabricate MEMS resonators using PMGI as a sacrificial layer
S. Young, D. Weston, B. Dauksher, D. Mancini, S. Pacheco2, P. Zurcher2, M. Miller2
Motorola Labs, 2100 E Elliot Road, Tempe, AZ 85284, USA 2 Freescale Semiconductor, 2100 E Elliot Road, Tempe, AZ 85284
J. Micromech. Microeng. 15 (2005) 1824–1830
(P-05-5) Nanometer metal line fabrication using a ZEP520/50K PMMA bilayer resist by e-beam lithography
Lihua An, Yuankai Zheng, Kebin Li, Ping Luo, and Yihong Wu
J. Vac. Sci. Technol. B 23, 1603 (2005)
(P-05-6) Sub-50 nm T-gate pseudomorphic HEMTs using low temperature development method
Kang-Sung Lee; Kyung-Taek Lee; Young-Su Kim; Yoon-Ha Jeong;
Nanotechnology, 2005. 5th IEEE Conference on 11-15 July 2005 Page(s):832 - 835 vol. 2
(P-05-7) Fabrication of monolithic multilevel high-aspect-ratio ferromagnetic devices
Tao Wang; McCandless, A.B.; Lienau, R.M.; Kelly, K.W.; Hensley, D.; Desta, Y.; Zhong-Geng Ling;
Microelectromechanical Systems, Journal of Volume 14, Issue 2, April 2005 Page(s):400 - 409
(P-05-8) Micro- and nanofabrication processes for hybrid synthetic and biological system fabrication
Verma, V.; Hancock, W.O.; Catchmark, J.M.;
Advanced Packaging, IEEE Transactions on [see also Components, Packaging and Manufacturing Technology, Part B: Advanced Packaging, IEEE Transactions on Volume 28, Issue 4, Nov. 2005 Page(s):584 – 593
2004
(P-04-1) 0.15?m In0.4GaAs/In0.4AlAs Metamorphic HEMT’s (M-HEMT’s) Using A Novel Triple Shaped Gate Structure Assisted By PMGI Resist
Dae-Hyun Kim, Suk-Jin Kim, *Jae-Hak Lee, *Ki-Woong Chung, and Kwang-Seok Seo
Seoul National University, Republic Of Korea
* WAVICS. Co. LTD, Republic Of Korea
Indium Phosphide and Related Materials, 16th IPRM 2004 International Conference IEEE
(P-04-2) Cost Effective T-Gate Process for PHEMT-based MMIC with Large Gate Periphery
B. Hadad2*, I. Toledo2, G. Bunin1, J. Kaplun1, M. Leibovitch1, Y. Shapira2 , Y. Knafo2
1Gal-El (MMIC), Ashdod 77102, Israel, 2Dept of Physical Electronics, Tel-Aviv U, Israel
GaAs ManTech 2004
(P-04-3) 0.15?m In0.4GaAs/In0.4AlAs Metamorphic HEMT’s (M-HEMT’s) Using A Novel Triple Shaped Gate Structure Assisted By PMGI Resist
Dae-Hyun Kim, Suk-Jin Kim, *Jae-Hak Lee, *Ki-Woong Chung, and Kwang-Seok Seo
Seoul National University, Republic Of Korea (ROK)
WAVICS. Co. LTD, Seoul, ROK
Indium Phosphide and Related Materials, 16th IPRM 2004 International Conference IEEE
(P-04-4) Extreme ultraviolet lithography based nanofabrication using a bilevel photoresist
A. A. Talin, G. F. Cardinale, T. I. Wallow, P. Dentinger, S. Pathak, D. Chinn, and D. R. Folk
J. Vac. Sci. Technol. B 22, 781 (2004)
(P-04-5) Suppression of kink phenomenon in ultra-high-speed strained InAs- inserted E-mode HEMTs with a new 0.1 /spl mu/m Y-shaped Pt-buried gate and their impacts on device performance
Dae-Hyun Kim; Tae-Woo Kim; Hun-Hee Noh; Jae-Hak Lee; Wei Feng; Xiaogang Xie; Quangang Du; Jiang Jian; Jong-In Song; Kwang-Seok Seo;
Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International
13-15 Dec. 2004 Page(s):1027 - 1030
(P-04-6) Process conditions for the fabrication of subwavelength scale structures by x-ray lithography in PMMA films
Sven C. Achenbach, Timo Mappes, Rainer Fettig, Jeanine Kando, and Juergen Mohr
Proc. SPIE 5450, 86 (2004)
(P-04-7) Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)
Wenchuang (Walter) Hu, Koshala Sarveswaran, Marya Lieberman, and Gary H. Bernstein
J. Vac. Sci. Technol. B 22, 1711 (2004)
(P-04-8) High performance of 0.15/spl mu/m quasi enhancement-mode (E-mode) In/sub 0.4/GaAs/In/sub 0.4/AlAs metamorphic HEMTs on GaAs substrate using new triple-gate technology
Dae-Hyun Kim; Hun-Hee Noh; Suk-Jin Kim; Jae-Hak Lee; Ki-Woong Chung; Kwang-Seok Seo;
Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
31 May-4 June 2004 Page(s):374 - 377
(P-04-9) Synthesis of nanoscale structures in single crystal silicon carbide by electron beam lithography
Bieber, J.A.; Saddow, S.E.; Moreno, W.A.;
Devices, Circuits and Systems, 2004. Proceedings of the Fifth IEEE International Caracas Conference on
Volume 1, 3-5 Nov. 2004 Page(s):158 - 163
(P-04-10) High performance 50 nm T-Gate In/sub 0.52/Al/sub 0.48/As/In/sub 0.70/Ga/sub 0.30/As pseudomorphic high electron mobility transistors
Xin Cao; Thorns, S.; McLelland, H.; Elgaid, K.; Stanley, C.; Thayne, I.;
Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
31 May-4 June 2004 Page(s):292 - 294
2003
(P-03-1) Fabrication of sub-50 nm critical feature for magnetic recording device using electron-beam lithography
XiaoMin Yang,a) Andrew Eckert, K. Mountfield, H. Gentile, C. Seiler, S. Brankovic, and E. Johns
Seagate Research, 1251 Waterfront Place, Pittsburgh, Pennsylvania 15222-4215
J. Vac. Sci. Technol. B 21.6., Nov-Dec 2003 1071-1023
(P-03-2) Electron-beam lithography method for sub-50-nm isolated trench with high aspect ratio
XiaoMin Yang, Andrew R. Eckert, Keith Mountfield, Harold Gentile, Carl Seiler, Stanko Brankovic, Robert Harris, and Earl Johns
Proc. SPIE 5037, 168 (2003)
(P-03-3) Challenges of implementing 193-nm lithography in printing sub-70nm line patterns for thin film heads
Chun-Ming Wang, Justin J. Hwu, and Timothy J. Minvielle
Proc. SPIE 5040, 1335 (2003)
(P-03-4) Challenges of implementing 193-nm lithography in printing sub-70nm line patterns for thin film heads
Chun-Ming Wang, Justin J. Hwu, and Timothy J. Minvielle
Proc. SPIE 5040, 1335 (2003)
(P-03-5) Fabrication of sub-50 nm critical feature for magnetic recording device using electron-beam lithography
XiaoMin Yang, Andrew Eckert, Keith Mountfield, Harold Gentile, Carl Seiler, Stanko Brankovic, and Earl Johns
J. Vac. Sci. Technol. B 21, 3017 (2003)
(P-03-6) Optical biosensor array based on natural ion channels
Cordelia A. Zimmerer, Hans-Georg Braun, Marco Kitsche, Gerald Steiner, Steffen Friedrich, and Reiner Salzer
Proc. SPIE 5047, 403 (2003)
(P-03-7) Large-area definition of nanoelectrodes by nanoimprint lithography
Matthias Wissen, Hella-Christin Scheer, Hubert Schulz, J. T. Horstmann, M. Scherff, and Wolfgang R. Fahrner
Proc. SPIE 5253, 122 (2003)
(P-03-8) Transient measurement of resist charging during electron beam exposure
Min Bai, W. Dan Meisburger, and R. Fabian W. Pease
J. Vac. Sci. Technol. B 21, 106 (2003)
(P-03-9) Efficient removers for poly(methylmethacrylate)
Qingling Hang, Davide A. Hill, and Gary H. Bernstein
J. Vac. Sci. Technol. B 21, 91 (2003)
(P-03-10) Fabrication of ultra thick, ultra high aspect ratio microcomponents by deep and ultra deep X-ray lithography
Jian, L.; Loechel, B.; Scheunemann, H.-U.; Bednarzik, M.; Desta, Y.M.; Goettert, J.;
MEMS, NANO and Smart Systems, 2003. Proceedings. International Conference on
20-23 July 2003 Page(s):10 - 14
(P-03-11) 3D fabrication using deep X-ray mask with integrated micro-actuator
Kwang-Cheol Lee; Lee, S.S.;
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on 19-23 Jan. 2003 Page(s):558 - 561
(P-03-12) Evolution of T-shaped gate lithography for compound semiconductors field-effect transistors
Tabatabaie-Alavi, K.; Shaw, D.M.; Duval, P.J.;
Semiconductor Manufacturing, IEEE Transactions on
Volume 16, Issue 3, Aug. 2003 Page(s):365 - 369
(P-03-13) Reduction in roughness of resist features in PMMA due to the absence of rinsing step
Khalid, M.N.; Yasin, S.; Hasko, D.G.; Ahmed, H.;
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
29-31 Oct. 2003 Page(s):66 - 67
(P-03-14) Fabrication of 0.1/spl mu/m-gate InP HEMTs using i-line lithography
Sawada, K.; Makiyama, K.; Takahashi, T.; Nozaki, K.; Igarashi, M.; Kon, J.; Hara, N.;
Indium Phosphide and Related Materials, 2003. International Conference on
12-16 May 2003 Page(s):65 - 68
2002
(P-02-1) Sub-100 nm T-gates utilizing a single E-beam lithography exposure process
Eric S. Ainley, Scott Ageno, Kevin J. Nordquist, and Douglas J. Resnick
Proc. SPIE 4690, 1150 (2002)
(P-02-2) A novel asymmetric gate recess process for InP HEMTs
Robin, F.; Meier, H.; Homan, O.J.; Bachtold, W.;
Indium Phosphide and Related Materials Conference, 2002. IPRM. 14th
12-16 May 2002 Page(s):221 - 224
(P-02-3) Micro-electro-mechanical tunable vertical cavity surface emitting lasers using metal flexures and a top dielectric stack distributed Bragg reflector
Harvey, M.C.; Lott, J.A.; Nelson, T.R., Jr.; Stintz, A.; Malloy, K.J.;
Semiconductor Laser Conference, 2002. IEEE 18th International 29 Sept.-3 Oct. 2002 Page(s):11 - 12
(P-02-4) Low stress development of poly(methylmethacrylate) for high aspect ratio structures
M. J. Rooks, E. Kratschmer, R. Viswanathan, J. Katine, R. E. Fontana, Jr., and S. A. MacDonald
J. Vac. Sci. Technol. B 20, 2937 (2002)
(P-02-5) Molecular patterning through high-resolution polymethylmethacrylate masks
Qingling Hang, Yuliang Wang, Marya Lieberman, and Gary H. Bernstein
Appl. Phys. Lett. 80, 4220 (2002)
(P-02-6) PMMA direct patterning by synchrotron radiation using SOG mask
Taniguchi, J.; Takezawa, S.; Kanda, K.; Haruyama, Y.; Matsui, S.; Miyamoto, I.;
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
6-8 Nov. 2002 Page(s):214
(P-02-7) Microlens fabrication by the modified LIGA process and its modeling and analysis
Sung-Keun Lee; Dong Sung Kim; Sang Sik Yang; Lee, S.S.; Tai Hun Kwon;
Optical MEMs, 2002. Conference Digest. 2002 IEEE/LEOS International Conference on
20-23 Aug. 2002 Page(s):77 - 78
(P-02-8) Microlens fabrication by the modified LIGA process
Sung-Keun Lee; Kwang-Cheol Lee; Lee, S.S.;
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
20-24 Jan. 2002 Page(s):520 - 523
(P-02-9) A novel asymmetric gate recess process for InP HEMTs
Robin, F.; Meier, H.; Homan, O.J.; Bachtold, W.;
Indium Phosphide and Related Materials Conference, 2002. IPRM. 14th
12-16 May 2002 Page(s):221 - 224
2001
(P-01-1) Electron-beam direct-write polymeric optical waveguides
Wing H. Wong and Edwin Y. B. Pun
Proc. SPIE 4453, 100 (2001)
(P-01-2) Influence of thermal properties of polymers on NanoImprint Lithography performance
Perret, C.; Gourgon, C.; Micouin, G.; Grolier, J.P.E.;
Microprocesses and Nanotechnology Conference, 2001 International
31 Oct.-2 Nov. 2001 Page(s):98 - 99
(P-01-3) Studies on the possibility of highly sensitive PMMA based chemically amplified resists for EB and X-ray lithography
Nakano, A.; Okamoto, K.; Kozawa, T.; Tagawa, S.;
Microprocesses and Nanotechnology Conference, 2001 International
31 Oct.-2 Nov. 2001 Page(s):236 - 237
2000
(P-00-1) Master replication into thermosetting polymers for nanoimprinting
H. Schulz, D. Lyebyedyev, H.-C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grützner, and J. Ahopelto
J. Vac. Sci. Technol. B 18, 3582 (2000)
(P-00-2) Effects of molecular properties on nanolithography in PMMA
- E. Dobisz, S. Brandow, R. Bass, J. Mitterender - NRL
- J. Vac. Sci. Technology B 18(1), pp 107- 111 Jan/Feb 2000
(P-00-3) Influence of developer and developer conditions on the behavior of high molecular weight e-beam resists
- D. Hasko, S. Yasin, A. Mumtaz - University of Cambridge
- J. Vac. Sci. Technology B 18(6), pp 3441- 3444 Nov/Dec 2000
(P-00-4) First demonstration of InAlAs/InGaAs HEMTs using T-gates fabricated by a bilayer of UVIII and PMMA resists
Chen, Y.; Lodhi, T.; McLelland, H.; Edgar, D.L.; Macintyre, D.; Thoms, S.; Stanley, C.R.; Thayne, I.G.;
High Performance Electron Devices for Microwave and Optoelectronic Applications, 2000 8th IEEE International Symposium on
13-14 Nov. 2000 Page(s):202 - 205
(P-00-5) Near- and mid-infrared “Yablonovite” structures fabricated in PMMA by X-ray lithography
Cuisin, C.; Chelnokov, A.; Chen, Y.; Decanini, D.; Lourtioz, J.-M.;
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
10-15 Sept 2000 Page(s):1 pp.
(P-00-6) Fabrication of sub-micron structures with high aspect ratio for MEMS using deep X-ray lithography
Ueno, H.; Nishi, N.; Sugiyama, S.;
Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on 23-27 Jan. 2000 Page(s):596 - 601
1999
(P-99-1) A novel gate process for InP based HEMTs with gate length from 0.06 to 0.2 ?m
Nawaz, M.; Persson, S.H.M.; Zirath, H.; Choumas, E.; Mellberg, A.;
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
16-20 May 1999 Page(s):14 - 16 suppl.
(P-99-2) DUV and e-beam chemistry of high-sensitivity positive PMMA-based resist
A. Uhl, Juergen Bendig, Ulrich A. Jagdhold, and Joachim J. Bauer
Proc. SPIE 3678, 1381 (1999)
(P-99-3) Novel fabrication technique for 0.1 µm T-shaped gate with i-line negative resist and poly(methylmethacrylate)
Yoshiharu Anda, Toshinobu Matsuno, Mitsuru Tanabe, Tomoya Uda, Manabu Yanagihara, Katsunori Nishii, Kaoru Inoue, Nobumitsu Hirose, and Toshiaki Matsui
J. Vac. Sci. Technol. B 17, 320 (1999)
(P-99-4) Low voltage electron beam lithography in PMMA
A. Olkhovets and H. G. Craighead
J. Vac. Sci. Technol. B 17, 1366 (1999)
(P-99-5) Fabrication of surface gratings in GaAs and AlGaAs by electron beam lithography and chemically assisted ion beam etching
Jens Dienelt, Karsten Otte, Klaus-Peter Zimmer, F. Pietag, and Frieder Bigl
Proc. SPIE 3739, 195 (1999)
(P-99-6) Electron beam lithography process for T- and -shaped gate fabrication using chemically amplified DUV resists and PMMA
Y. Chen, D. Macintyre, and S. Thoms
J. Vac. Sci. Technol. B 17, 2507 (1999)
(P-99-7) Fabrication of surface gratings in GaAs and AlGaAs by electron beam lithography and chemically assisted ion beam etching
Jens Dienelt, Karsten Otte, Klaus-Peter Zimmer, F. Pietag, and Frieder Bigl
Proc. SPIE 3739, 195 (1999)
(P-99-8) Fabrication of T-shaped gates using UVIII chemically amplified DUV resist and PMMA
Chen, Y.; Macintyre, D.; Thoms, S.;
Electronics Letters Volume 35, Issue 4, 18 Feb. 1999 Page(s):338 - 339
(P-99-9) A novel gate process for InP based HEMTs with gate length from 0.06 to 0.2 ?m
Nawaz, M.; Persson, S.H.M.; Zirath, H.; Choumas, E.; Mellberg, A.;
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
16-20 May 1999 Page(s):14 - 16 suppl.
(P-99-10) The fabrication of grating for 1.55 ?m InGaAsP DFB laser array by e-beam lithography
Yue-Bun, E.; Wong, P.W.H.;
Communications, 1999. APCC/OECC '99. Fifth Asia-Pacific Conference on ... and Fourth Optoelectronics and Communications Conference Volume 2, 18-22 Oct. 1999 Page(s):1545 - 1547 vol.2
(P-99-11) A dynamic simulation of electron beam induced charging-up of insulators
Kotera, M.; Yamaguchi, K.; Suga, H.;
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International 6-8 July 1999 Page(s):166 - 167
1998
(P-98-1) Study on fabrication of high aspect ratio electrostatic microactuators using LIGA process
Kondo, R.; Suzuki, K.; Sugiyama, S.;
Micromechatronics and Human Science, 1998. MHS '98. Proceedings of the 1998 International Symposium on 25-28 Nov. 1998 Page(s):155 - 160
(P-98-2) Positive resists for electron-beam and X-ray lithography
Bulgakova, S.A.; Mazanova, L.M.; Semchikov, Yu.D.; Lopatin, A.Y.; Luchin, V.I.; Salashchenko, N.N.;
Electronic Instrument Engineering Proceedings, 1998. APEIE-98. Volume 1. 4th International Conference on Actual Problems of 23-26 Sept. 1998 Page(s):81 - 82
(P-98-3) Exposure of PMMA with STM under ambient condition
Rujiang Tian; Jieping Han; Shouwu Wang;
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
21-23 Oct. 1998 Page(s):106 - 108
1997 and earlier
(P-96-1) Electron-beam/ultraviolet hybrid exposure combined with novel bilayer resist system for a 0.15 mm T-shaped gate fabrication process
H. Takano, H. Nakano, H. Minami, K. Hosogi, N. Yoshida, and K. Sato, Y. Hirose and N. Tsubouchi
High Frequency and Optical Semiconductor Division, Mitsubishi Electric Corporation, Itami 664, Japan
J. Vac. Sci. Technol. B 14(6), Nov/Dec 1996
(P-96-2) Effect of molecular weight on poly (methyl methacrylate) resolution
- M. Khoury and D. Ferry - Arizona State
- J. Vac. Sci. Technology B 14(1), pp 75- 79 Jan/Feb 1996
(P-94-1) Plasma resistant modified I-line, deep UV and E-beam resists
Bousaba, J.E.; Tranjan, F.M.; Qushair, L.E.; DuBois, T.D.; Bobbio, S.M.; Jose, M.T.; Nickel, J.L.; Jones, S.K.; Dudley, B.;
Electronic Components and Technology Conf., 1994. Proceedings., 44th 1-4 May 1994 P:712 - 715
(P-87-1) Two-layer resist structure for electron-beam fabrication of a submicrometer gate length GaAs device
Kato, T.; Hayashi, K.; Sasaki, Y.;
Electron Devices, IEEE Transactions on Volume 34, Issue 4, Apr 1987 Page(s):753 - 758
(P-85-1) High-speed GaAs frequency dividers using a self-aligned dual-level double lift-off substitution gate MESFET process
Chang, M.F.; Lee, S.J.; Walton, E.R.; Lee, C.P.; Ryan, F.J.; Vahrenkamp, R.P.; Kirkpatrick, C.G.;
Electron Device Letters, IEEE Volume 6, Issue 6, Jun 1985 Page(s):279 – 281
(P-75-1) Developer Characteristics of Poly-(Methyl Methacrylate) Electron Resist
- J. Greeneich - GMRL
- J. Electrochem. Soc., Vol 122, 970-6, 1975
2006
(S-06-1) Dry etching release of polymer-based cantilevers with integrated electrodes
S. Mouaziz, C. Imboden, G. Boero, R. Popovic and J. Brugger
Microsystems Laboratory, EPFL-STI-IMM-LMIS Lausanne 1015 Switzerland
International Workshop on Nanomechanical Sensors, Copenhagen, Denmark, May 7-10, 2006
(S-06-2) Surface stress measurements in liquid using SU-8 cantilevers with integrated readout
Alicia Johansson, Gabriela Blagoi and Anja Boisen
Department of Micro and Nanotechnology (MIC), Technical University of Denmark (DTU), Bldg. 345 east, 2800 Kgs. Lyngby, Denmark MNE 06
(S- 06-3) Fabricating multilevel SU-8 structures in a single photolithographic step using colored masking patterns
J. Taff, Y. Kashte, V. Spinella-Mamo, and M. Paranjapea_
Department of Physics and GAEL Health Microsystems, Georgetown University, Washington, DC 20057
J. Vac. Sci. Technol. A 24„3…, May/Jun 2006
(S-06-4) Development of 3D out-of-plane SU-8 microlenses using modified micromolding in capillaries (MIMIC) technology
A. Llobera, R. Wilke, D. W. Johnson, and S. Büttgenbach
Proc. SPIE 6185, 618512 (2006)
(S-06-5) SU 8 multiple layer structuring by means of maskless photolithography (DWL66)
Amir A. Saghiri, Matthias Kaden, Konrad Rössler, Roel Wijnaendts, Sven Preuss, and Alexander Forozan
Proc. SPIE 6110, 611003 (2006)
(S-06-6) Optimization of SU-8 processing for integrated optics
Thomas A. Anhoj, Anders M. Jorgensen, Dan A. Zauner, and Jörg Hübner
Proc. SPIE 6110, 611009 (2006)
(S-06-7) Grey scale electron-beam lithography in functionalized SU-8 for active optical devices
S. Balslev, T. Rasmussen, P. Shi, and A. Kristensen
Proc. SPIE 6110, 61100C (2006)
(S-06-8) Monolithic single mode SU-8 waveguides for integrated optics
Maria Nordström, Dan A. Zauner, Anja Boisen, and Jörg Hübner
Proc. SPIE 6112, 611206 (2006)
(S-06-9) Characterization of SU-8 optical multimode waveguides for integrated optics and sensing on microchip devices
A. Piruska, A. A. S. Bhagat, K. Zhou, E.T.K. Peterson, I. Papautsky, and C. J. Seliskar
Proc. SPIE 6112, 611207 (2006)
(S-06-10) An injection micromixer fabricated by improved SU-8 processing for biochemical microfluidic systems
Changgeng Liu, Zhong-geng Ling, Kun Lian, Jost Goettert, and Josef Hormes
Proc. SPIE 6112, 61120G (2006)
(S-06-11)Fabrication and test of an electrochemical microactutor
Dong Eun Lee, Steven A. Soper, and Wanjun Wang
Proc. SPIE 6112, 61120N (2006)
(S-06-12) Study of nano-imprint for sub-100-nm patterning by using SU-8 3000NIL resist
Atsushi Sekiguchi, Yoshiyuki Kono, Satoshi Mori, Nao Honda, and Yoshihiko Hirai
Proc. SPIE 6151, 61512H (2006)
(S-06-13) Development of 3D out-of-plane SU-8 microlenses using modified micromolding in capillaries (MIMIC) technology
A. Llobera, R. Wilke, D. W. Johnson, and S. Büttgenbach
Proc. SPIE 6185, 618512 (2006)
(S-06-14) Fabricating multilevel SU-8 structures in a single photolithographic step using colored masking patterns
J. Taff, Y. Kashte, V. Spinella-Mamo, and M. Paranjape
J. Vac. Sci. Technol. A 24, 742 (2006)
(S-06-15) Photothermally enabled lithography for refractive-index modulation in SU-8 photoresist
Biow Hiem Ong, Xiaocong Yuan, Shaohua Tao, and Swee Chuan Tjin
Opt. Lett. 31, 1367 (2006)
(S-06-16) Adhesive Wafer Bonding with SU-8 Intermediate Layers for Microfluidic Applications
Viorel Dragoi, Gerald Mittendorfer, Christine Thanner, Thorsten Matthias, Thomas Glinsner, and Paul Lindner
Meet. Abstr. - Electrochem. Soc. 602, 1391 (2006)
(S-06-17) Comparison of high resolution negative electron beam resists
B. Bilenberg, M. Schøler, P. Shi, M. S. Schmidt, P. Bøggild, M. Fink, C. Schuster, F. Reuther, C. Gruetzner, and A. Kristensen
J. Vac. Sci. Technol. B 24, 1776 (2006)
(S-06-18) Three-dimensional SU-8 structures by reversal UV imprint
W. Hu, B. Yang, C. Peng, and S. W. Pang
J. Vac. Sci. Technol. B 24, 2225 (2006)
(S-06-19) Adding grayscale layer to chrome photomasks
David K. Poon, James M. Dykes, Chinheng Choo, Jimmy T. K. Tsui, Jun Wang, Glenn H. Chapman, Yuqiang Tu, Patrick Reynolds, and Andrew Zanzal
Proc. SPIE 6349, 634931 (2006)
(S-06-20) Development of a MEMS-fabricated SU-8 device for 2D separations
K. P. Bloschock, T. W. Schneider, Abul Hussam, and E. R. Van Keuren
Proc. SPIE 6380, 63800I (2006)
(S-06-21) Adhesive Wafer Bonding with SU-8 Intermediate Layers for Microfluidic Applications
Viorel Dragoi, Gerald Mittendorfer, Christine Thanner, Thorsten Matthias, Thomas Glinsner, and Paul Lindner
ECS Trans. 3, (6) 369 (2006)
(S-06-22) Multiple level nanochannels fabricated using reversal UV nanoimprint
B. Yang and S. W. Pang
J. Vac. Sci. Technol. B 24, 2984 (2006)
(S-06-23) CMOS compatible integration of three-dimensional microfluidic systems based on low-temperature transfer of SU-8 films
Zheng-chun Peng; Zhong-geng Ling; Tondra, M.; Chang-geng Liu; Min Zhang; Kun Lian; Goettert, J.; Hormes, J.;
Microelectromechanical Systems, Volume 15, Issue 3, June 2006 Page(s):708 - 716
(S-06-24) Polymer-based cantilevers with integrated electrodes
Mouaziz, S.; Boero, G.; Popovic, R.S.; Brugger, J.;
Microelectromechanical Systems, Volume 15, Issue 4, Aug. 2006 Page(s):890 - 895
(S-06-25) Numerical simulation of SU-8 optical accelerometers
Llobera, A.; Cadarso, V.J.; Seidemann, V.; Buttgenbach, S.; Plaza, J.A.;
Thermal, Mechanical and Multiphysics Simulation and Experiments in Micro-Electronics and Micro-Systems, 2006. EuroSime 2006. 7th International Conference, 24-26 April 2006 Page(s):1 - 8
(S-06-26) Metal foundation construction to consolidate electroplated structures for successful removal of SU-8 mould
Cui, F.; Chen, W.-Y.; Zhao, X.-L.; Jing, X.-M.; Wu, X.-S.;
Electronics Letters; Volume 42, Issue 12, 8 June 2006 Page(s):690 - 691
(S-06-27) UV-sensitive photofunctional device using evanescent field absorption between SU-8 polymer optical waveguide and photochromic dye
Jang, S.-W.; Son, S.-J.; Do-Eok Kim; Dae-Hyuk Kwon; Sung-Hoon Kim; Young-Hyun Lee; Shin-Won Kang; Photonics Technology Letters, IEEE; Volume 18, Issue 1, Jan. 1, 2006 Page(s):82 - 84
(S-06-28) Multidirectional UV Lithography for Complex 3-D MEMS Structures
Yoon, Y.-K.; Park, J.-H.; Allen, M.G.;
Microelectromechanical Systems, Volume 15, Issue 5, Oct 2006 Page(s):1121 - 1130
(S-06-29) A Single-Layer Multiple Degree-Of-Freedom PDMS-On-Silicon Dynamic Focus Micro-Lens
Tung, Y.-C.; Kurabayashi, K.;
Micro Electro Mechanical Systems, 2006. MEMS 2006 Istanbul. 19th IEEE International Conference on 22-26 Jan. 2006 Page(s):838 - 841
(S-06-30) Micromachined SU-8 Probe Integrated with Film-bulk-acoustic Resonant Mass Sensor
Hao Zhang; Wei Pang; Eun Sok Kim;
Micro Electro Mechanical Systems, 2006. MEMS 2006 Istanbul. 19th IEEE International Conference on 22-26 Jan. 2006 Page(s):82 - 85
(S-06-31) Polymeric MOEMS Variable Optical Attenuator
Llobera, A.; Villanueva, G.; Cadarso, V. J.; Battgenbach, S.; Plaza, J. A.;
Photonics Technology Letters, IEEE Volume 18, Issue 22, Nov.15, 2006 Page(s):2425 - 2427
(S-06-32) Single-mode rib optical waveguides on SOG/SU-8 polymer and integrated Mach-Zehnder for designing thermal sensors
Pelletier, N.; Beche, B.; Gaviot, E.; Camberlein, L.; Grossard, N.; Polet, F.; Zyss, J.;
Sensors Journal, IEEE; Volume 6, Issue 3, June 2006 Page(s):565 - 570
(S-06-33) Corrections to “UV-Sensitive Photofunctional Device Using Evanescent Field Absorption Between SU-8 Polymer Optical Waveguide and Photochromic Dye”
Jang, S.-W.; Son, S.-J.; Kim, D.-E.; Kwon, D.-H.; Kim, S.-H.; Lee, Y.-H.; Kang, S.-W.;
Photonics Technology Letters, IEEE
Volume 18, Issue 11, June 2006 Page(s):1282 - 1282
Digital Object Identifier 10.1109/LPT.2006.876889
(S-06-34) Fabrication and Characterization of Three-Dimensional Microlens Arrays in Sol-Gel Glass
Orhan, J.-B.; Parashar, V.K.; Sayah, A.; Gijs, M.A.M.;
Microelectromechanical Systems, Journal of
Volume 15, Issue 5, Oct 2006 Page(s):1159 - 1164
(S-06-35) Fabrication of PZT sol gel composite ultrasonic transducers using batch fabrication micromolding
Guofeng Pang; Sayer, M.; Lockwood, G.R.; Watt, M.;
Ultrasonics, Ferroelectrics and Frequency Control, IEEE Transactions on
Volume 53, Issue 9, Sept. 2006 Page(s):1679 - 1684
(S-06-36) Three-Dimensional Metal Patterning over Nanostructures by Reversal Imprint
Peng, C.; Pang, S.W.;
Nanotechnology, 2006. IEEE-NANO 2006. Sixth IEEE Conference
Volume 1, 17-20 June 2006 Page(s):59 - 61
(S-06-37) Integration of SOI and SU-8 in a Surface-Micromachining-like Process and Its Application in Micro-Optical Systems
Yi Chiu; Chung-Wei Wu; Zhi-Wei Zhuang; Jin-Chern Chiou; Han-Ping D. Shieh;
Optical MEMS and Their Applications Conference, 2006. IEEE/LEOS International Conference
21-24 Aug. 2006 Page(s):140 - 141
(S-06-38) Rapid Fabrication Process for High Aspect-Ratio Embedded Microchannels with Orifices Usinga Single SU-8 Layer Onamask
Suzuki, T.; Tokuda, T.; Yamamoto, H.; Ohoka, M.; Kanno, I.; Washizu, M.; Kotera, H.;
Micro Electro Mechanical Systems, 2006. MEMS 2006 Istanbul. 19th IEEE International Conference 22-26 Jan. 2006 Page(s):346 - 349
(S-06-39) Temperature effects in Au piezoresistors integrated in SU-8 cantilever chips
A Johansson, O Hansen, J Hales and A Boisen
J. Micromech. Microeng. 16 No 12 (December 2006) 2564-2569
(S-06-40) An all SU-8 microfluidic chip with built-in 3D fine microstructures
Hironobu Sato, Hirokazu Matsumura, Satoshi Keino and Shuichi Shoji
J. Micromech. Microeng. 16 No 11 (November 2006) 2318-2322
(S-06-41) AFM-measured surface roughness of SU-8 structures produced by deep x-ray lithography
K D Vora, B Lochel, E C Harvey, J P Hayes and A G Peele
J. Micromech. Microeng. 16 No 10 (October 2006) 1975-1983
(S-06-42) A planar self-sacrificial multilayer SU-8-based MEMS process utilizing a UV-blocking layer for the creation of freely moving parts
I G Foulds and M Parameswaran
J. Micromech. Microeng. 16 No 10 (October 2006) 2109-2115
(S-06-43) Fabrication of three-dimensional periodic microstructures in photoresist SU-8 by phase-controlled holographic lithography
Toshiaki Kondo, Saulius Juodkazis, Vygantas Mizeikis, Shigeki Matsuo and Hiroaki Misawa
New J. Phys. 8 No 10 (October 2006) 250
(S-06-44) High pressure-resistant SU-8 microchannels for monolithic porous structure integration
Julien Carlier, Katarzyna Chuda, Steve Arscott, Vincent Thomy, Bernard Verbeke, Xavier Coqueret, Jean Christophe Camart, Christian Druon and Pierre Tabourier
J. Micromech. Microeng. 16 No 10 (October 2006) 2211-2219
(S-06-45) The effect of soft bake temperature on the polymerization of SU-8 photoresist
Thomas A Anhoj, Anders M Jorgensen, Dan A Zauner and Jörg Hübner
J. Micromech. Microeng. 16 No 9 (September 2006) 1819-1824
(S-06-46) Using imprinting technology to fabricate three-dimensional devices from moulds of thermosetting polymer patterns
Jem-Kun Chen, Fu-Hsiang Ko, Chia-Hao Chan, Chih-Feng Huang and Feng-Chih Chang
Semicond. Sci. Technol. 21 No 9 (September 2006) 1213-1220
(S-06-47) Fabrication of metallic patterns by microstencil lithography on polymer surfaces suitable as microelectrodes in integrated microfluidic systems
Nao Takano, Lianne M Doeswijk, Marc A F van den Boogaart, Janko Auerswald, Helmut F Knapp, Olivier Dubochet, Thomas Hessler and Jürgen Brugger
J. Micromech. Microeng. 16 No 8 (August 2006)1606-1613
(S-06-48) IR laser-assisted micro/nano-imprinting
Chun-Hung Chen, Chuan-Pu Liu, Yung-Chun Lee, Fei-Bin Hsiao, Cheng-Yu Chiu, Ming-Hung Chung and Ming-Hsueh Chiang
J. Micromech. Microeng. 16 No 8 (August 2006) 1463-1467
(S-06-49) Improved polymer–glass adhesion through micro-mechanical interlocking
M P Larsson and M M Ahmad
J. Micromech. Microeng. 16 No 6 (June 2006) S161-S168
(S-06-50) Creating multi-layered structures with freestanding parts in SU-8
Frederik Ceyssens and Robert Puers
J. Micromech. Microeng. 16 No 6 (June 2006) S19-S23
(S-06-51) New 'monolithic' templates and improved protocols for soft lithography and microchip fabrication
Antoine Pallandre, Debjani Pal, Bertrand de Lambert, Jean-Louis Viovy and Claus Fütterer
J. Phys.: Condens. Matter 18 No 18 (10 May 2006) S665-S676
(S-06-52) Microfluidic-optical integrated CMOS compatible devices for label-free biochemical sensing
F J Blanco, M Agirregabiria, J Berganzo, K Mayora, J Elizalde, A Calle, C Dominguez and L M Lechuga
J. Micromech. Microeng. 16 No 5 (May 2006) 1006-1016
(S-06-53) Three-dimensional microfabrication in negative resist using printed masks
Daniel Haefliger and Anja Boisen
J. Micromech. Microeng. 16 No 5 (May 2006) 951-957
(S-06-54) Adhesive bonding with SU-8 at wafer level for microfluidic devices
Liming Yu, Francis E H Tay, Guolin Xu, Bangtao Chen, Marioara Avram and Ciprian Iliescu
J. Phys.: Conf. Ser. 34 (2006) 776-781
(S-06-55) A novel and simple fabrication method of embedded SU-8 micro channels by direct UV lithography
C Fu, C Hung and H Huang
J. Phys.: Conf. Ser. 34 (2006) 330-335
(S-06-56) Novel exposure methods based on reflection and refraction effects in the field of SU-8 lithography
Won-Jong Kang, Erik Rabe, Stefan Kopetz and Andreas Neyer
J. Micromech. Microeng. 16 No 4 (April 2006) 821-831
(S-06-57) Low temperature adhesion bonding for BioMEMS
Jörg Kentsch, Stefanie Breisch and Martin Stelzle
J. Micromech. Microeng. 16 No 4 (April 2006)802-807
(S-06-58) Electrically conducting probes with full tungsten cantilever and tip for scanning probe applications
J A J Steen, J Hayakawa, T Harada, K Lee, F Calame, G Boero, A J Kulik and J Brugger
Nanotechnology 17 No 5 (14 March 2006)1464-1469
(S-06-59) SU-8 cantilever chip interconnection
A Johansson, J Janting, P Schultz, K Hoppe, I N Hansen and A Boisen
J. Micromech. Microeng. 16 No 2 (February 2006) 314-319
(S-06-60) Fabrication of multi-layer SU-8 microstructures
Alvaro Mata, Aaron J Fleischman and Shuvo Roy
J. Micromech. Microeng. 16 No 2 (February 2006) 276-284
(S-06-61) A novel fabrication method of flexible and monolithic 3D microfluidic structures using lamination of SU-8 films
Patrick Abgrall, Christine Lattes, Véronique Conédéra, Xavier Dollat, Stéphane Colin and Anne Marie Gué
J. Micromech. Microeng. 16 No 1 (January 2006) 113-121
2005
(S-05-1) Interconnected multilevel microfluidic channels fabricated using low-temperature bonding of SU-8 and multilayer lithography
Zheng-Chun Peng, Zhong-Geng Ling, Jost Goettert, Josef Hormes, and Kun Lian
Proc. SPIE 5718, 209 (2005)
(S-05-2) Microfabrication of an integrated SU-8 waveguide with an embedded focusing lens for application in single-molecule detection (SMD)
Ren Yang, Steven A. Soper, and Wanjun Wang
Proc. SPIE 5718, 54 (2005)
(S-05-3) Fabrication of out-of-plane refractive concave and convex microlens arrays
Ren Yang, Steven A. Soper, and Wanjun Wang
Proc. SPIE 5717, 134 (2005)
(S-05-4) Fabrication of microstructures with different aspect ratios in a single layer
Yao Fu, Erol C. Harvey, and Muralidhar K. Ghantasala
Proc. SPIE 5650, 156 (2005)
(S-05-5) Selective adhesive bonding with SU-8 for zero-level-packaging
Danny S. Reuter, Andreas Bertz, Gunther Schwenzer, and Thomas Gessner
Proc. SPIE 5650, 163 (2005)
(S-05-6) Fabrication of an integrated microfluidic and surface acoustic wave device for fluid analysis
David A. Karla, Anthony S. Holland, Gary Rosengarten, and Kourosh Kalantar-Zadeh
Proc. SPIE 5650, 189 (2005)
(S-05-7) Fully integrated optical systems for lab-on-a-chip applications
Soren Balslev, Brian Bilenberg, Daniel Nilsson, Anders M. Jorgensen, Anders Kristensen, Oliver Geschke, Jorg P. Kutter, Klaus B. Mogensen, and Detlef Snakenborg
Proc. SPIE 5730, 211 (2005)
(S-05-8) Optimized SU-8 UV-lithographical process for a Ka-band filter fabrication
Peng Jin, Kyle Jiang, Jiubin Tan, and M. J. Lancaster
Proc. SPIE 5852, 352 (2005)
(S-05-9) SU 8 used as optical waveguide in integrated optical microsensor for biological applications
Raluca M ller et al.
Proc. SPIE 5972, 59720Z (2005)
(S-05-10) Characterization of optical accelerometers based on SU-8
A. Llobera, V. Seidemann, J. A. Plaza, V. J. Cadarso, and S. Büttgenbach
Proc. SPIE 5956, 59560W (2005)
(S-05-11) Low-stress ultra-thick SU-8 UV photolithography process for MEMS
Bo Li, Miao Liu, and Quanfang Chen
J. Microlith., Microfab., Microsyst. 4, 043008 (2005)
(S-05-12) Functionalized SU-8 patterned with x-ray lithography
S. Balslev and F. Romanato
J. Vac. Sci. Technol. B 23, 2910 (2005)
(S-05-13) Nanofabrication by direct laser writing and holography (Invited Paper)
Kock K. Seet, Vygandas Jarutis, Saulius Juodkazis, and Hiroaki Misawa
Proc. SPIE 6050, 60500S (2005)
(S-05-14) Process optimisation for compact high aspect ratio SU-8 microstructures using x-ray lithography
K. D. Vora, B. Y. Shew, E. C. Harvey, J. P. Hayes, and A. G. Peele
Proc. SPIE 6037, 603701 (2005)
(S-05-15) Visco-elastic properties of micron-thick SU-8 polymers measured by two different types of uniaxial tensile tests
Namazu, T.; Inoue, S.; Takio, K.; Fujita, T.; Maenaka, K.; Koterazawa, K.;
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on 30 Jan.-3 Feb. 2005 Page(s):447 – 450
(S-05-16) Ultra-sensitive biosensor based on SU-8 planar interferometer
Shew, B.Y.; Tsai, Y.H.; Kuo, C.H.;
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Volume 2, 5-9 June 2005 Page(s):1784 - 1787 Vol. 2
(S-05-17) Polymer-core conductor approaches for RF MEMS
Yong-Kyu Yoon; Jin-Woo Park; Allen, M.G.;
Microelectromechanical Systems, Journal of
Volume 14, Issue 5, Oct. 2005 Page(s):886 - 894
(S-05-18) CMP of PC, PMMA and SU-8 Polymers
Zhong, Z.W.; Wang, Z.F.; Zirajutheen, B.M.P.; Tan, Y.S.; Tan, Y.H.;
Polymers and Adhesives in Microelectronics and Photonics, Polytronic, 2005. Polytronic 2005. 5th International Conference on
23-26 Oct. 2005 Page(s):58 - 62
(S-05-19) Two-Photon Laser Lithography of photonic microstructures in photoresist SU-8
Mizeikis, V.; Seet, K.-K.; Juodkazis, S.; Jarutis, V.; Misawa, H.;
Lasers and Electro-Optics, 2005. CLEO/Pacific Rim 2005. Pacific Rim Conference on
30-02 Aug. 2005 Page(s):1735 - 1736
(S-05-20) Polymer microlenses with modified micromolding in capillaries (MIMIC)technology
Llobera, A.; Wilke, R.; Johnson, D.W.; Buttgenbach, S.;
Photonics Technology Letters, IEEE
Volume 17, Issue 12, Dec. 2005 Page(s):2628 - 2630
(S-05-21) Development of a multi-layer SU-8 process for terahertz frequency waveguide blocks
Smith, C.H., III; Haiyong Xu; Barker, N.S.;
Microwave Symposium Digest, 2005 IEEE MTT-S International
12-17 June 2005 Page(s):4 pp.
(S-05-22) 10Gbps multi-mode waveguide for optical interconnect
Yi-Ming Chen; Cheng-Lin Yang; Yao-Ling Cheng; Hsiu-Hsiang Chen; Ying-Chih Chen; Yen Chu; Tsung-Eong Hsieh;
Electronic Components and Technology Conference, 2005. Proceedings. 55th
31 May-3 June 2005 Page(s):1739 - 1743 Vol. 2
(S-05-23) High frequency design and characterization of SU-8 based conductor backed coplanar waveguide transmission lines
Mbairi, F.D.; Hesselbom, H.;
Advanced Packaging Materials: Processes, Properties and Interfaces, 2005. Proceedings. International Symposium on
16-18 March 2005 Page(s):243 - 248
(S-05-24) Electrothermally Activated SU-8 Microgripper for Single Cell Manipulation in Solution
Chronis, N.; Lee, L.P.;
Microelectromechanical Systems, Journal of
Volume 14, Issue 4, Aug. 2005 Page(s):857 - 863
(S-05-25) A novel technology for fabricating microneedle of SU-8
Zhan Zhao; Ning Qin; Li Wang; Bojun Zhang;
Information Acquisition, 2005 IEEE International Conference on; 27 June-3 July 2005 Page(s):4 pp.
(S-05-26) Development of an SU-8 Fabry-Perot blood pressure sensor
Melamud, R.; Davenport, A.A.; Hill, G.C.; Chan, I.H.; Declercq, F.; Hartwell, P.G.; Pruitt, B.L.;
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
30 Jan.-3 Feb. 2005 Page(s):810 – 813
(S-05-27) A simple and low-cost fabrication of polymeric vertical microlens using dip method
Chih-Chao Yang; Te-Chin Peng; Yun-Hsun Huang; Meng-Chyi Wu; Chong-Long Ho; Wen-Jeng Ho;
Photonics Technology Letters, IEEE; Volume 17, Issue 3, Mar 2005 Page(s):603 - 605
(S-05-28) 3D self-assembling of SU-8 microstructures on silicon by plasma induced compressive stress
Bureau, J.-B.; Legrand, B.; Collard, D.; Buchaillot, L.;
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on; Volume 1, 5-9 June 2005 Page(s):19 - 22 Vol. 1
(S-05-29) Integrated Mach-Zehnder interferometer on SU-8 polymer for designing pressure sensors
Pelletier, N.; Beche, B.; Tahani, N.; Camberlein, L.; Gaviot, E.; Goullet, A.; Landesman, J.-P.; Zyss, J.;
Sensors, 2005 IEEE; 30 Oct.-3 Nov. 2005 Page(s):4 pp
(S-05-30) All plastic microfluidic device with built-in 3-D fine microstructures
Matsumura, H.; Sato, H.; Houshi, Y.; Shoji, S.;
Microprocesses and Nanotechnology Conference, 2005 International
25-28 Oct. 2005 Page(s):270 - 271
(S-05-31) Micro-mirror arrays for adaptive optics fabricated in polymer technology
Friese, C.; Zappe, H.;
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Volume 2, 5-9 June 2005 Page(s):1342 - 1345 Vol. 2
(S-05-32) Selective formation of porous silicon using silicon nitride and SU-8 masks for electroluminescence applications
Celigiieta, I.; Arana, S.; Gracia, F.J.; Castano, E.;
Electron Devices, 2005 Spanish Conference on
2-4 Feb. 2005 Page(s):331 - 334
(S-05-33) SU-8 lift-off patterned silicone chemical vapor sensor arrays
Wong, V.T.S.; Huang, A.; Chih-Ming Ho;
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
30 Jan.-3 Feb. 2005 Page(s):754 - 757
(S-05-34) Contact printed masks for 3D microfabrication in negative resists
Haefliger, D.; Boisen, A.;
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
30 Jan.-3 Feb. 2005 Page(s):556 - 559
(S-05-35) Flow rate measurement inside polymer microfluidic systems using carbon nanotube sensors
Fung, C.K.M.; Sin, M.L.Y.; Lei, T.K.F.; Chow, W.W.Y.; Lai, K.W.C.; Li, W.J.;
Sensors, 2005 IEEE; 30 Oct.-3 Nov. 2005 Page(s):4 pp
(S-05-36) Design and Experimental Validation of A SU-8 Based Micro-Psychrometer
Giordani, N.; Camberlein, L.; Gaviot, E.; Polet, F.; Pelletier, N.; Beche, B.;
Instrumentation and Measurement Technology Conference, 2005. IMTC 2005. Proc of the IEEE
Volume 3, 16-19 May 2005 Page(s):1848 - 1851
(S-05-37) Three-dimensional Spiral Architecture Photonic Crystals Obtained in a Negative Photoresist SU-8 by Direct Laser Writing
Seet, K.K.; Mizeikis, V.; Juodkazis, S.; Misawa, H.;
Lasers and Electro-Optics, 2005. CLEO/Pacific Rim 2005. Pacific Rim Conference on
30-02 Aug. 2005 Page(s):1733 - 1734
(S-05-38) Rapid manufacturing of embedded microchannels from a single layer of SU-8, and determining the dependence of SU-8 young's modulus on exposure dose with a laser acoustic technique
Yu, H.; Balogun, O.; Li, B.; Murray, T.W.; Zhang, X.;
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
30 Jan.-3 Feb. 2005 Page(s):654 - 657
(S-05-39) A novel method for the fabrication of high-aspect ratio C-MEMS structures
Chunlei Wang; Guangyao Jia; Taherabadi, L.H.; Madou, M.J.;
Microelectromechanical Systems, Journal of
Volume 14, Issue 2, April 2005 Page(s):348 - 358
(S-05-40) Self-actuated polymeric valve for autonomous sensing and mixing
Haefliger, D.; Marie, R.; Boisen, A.;
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on; Volume 2, 5-9 June 2005 Page(s):1569 - 1572 Vol. 2
(S-05-41) Dead-end injection molding of polymeric microcantilever arrays
Wan Ho Song; Hierlemann, A.; Lichtenberg, J.;
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Volume 2, 5-9 June 2005 Page(s):2040 - 2043 Vol. 2
(S-05-42) Replication of microneedle arrays using vacuum casting and hot embossing
Trautmann, A.; Heuck, F.; Mueller, C.; Ruther, P.; Paul, O.;
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Volume 2, 5-9 June 2005 Page(s):1420 - 1423 Vol. 2
(S-05-43) Characterization and modeling of a liquid-vapor phase change membrane actuator with an integrated SU-8 micro capillary wicking structure
Whalen, S.A.; Won, S.Y.; Richards, R.F.; Bahr, D.F.; Richards, C.D.;
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on; Volume 1, 5-9 June 2005 Page(s):342 - 347 Vol. 1
(S-05-44) A SU-8 microfluidic total analysis system integrating silicon photodiodes and buried waveguides
de la Fuente, P.; Etxeberria, J.A.; Berganzo, J.; Arroyo, M.T.; Castano, E.; Gracia, F.J.; Ruano-Lopez, J.M.;
Electron Devices, 2005 Spanish Conference on; 2-4 Feb. 2005 Page(s):461 - 464
(S-05-45) A lateral, self-cleaning, direct contact MEMS switch
Yong Shi; Sang-Gook Kim;
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
30 Jan.-3 Feb. 2005 Page(s):195 - 198
(S-05-46) Geometric Optimization of SU-8 Piezoresistive Cantilever Sensors for Biochemical Applications
Sukuabol, S.; Sood, D.K.; Rosengarten, G.;
Intelligent Sensors, Sensor Networks and Information Processing Conference, 2005. Proceedings of the 2005 International Conference on
5-8 Dec. 2005 Page(s):247 - 252
(S-05-47) Fabrication of Robust 2-D and 3-D Microfluidic Networks for Lab-on-a-Chip Bioassays
Yasukawa, T.; Glidle, A.; Nomura, M.; Cooper, J.M.;
Microelectromechanical Systems, Journal of
Volume 14, Issue 4, Aug. 2005 Page(s):839 - 846
Digital Object Identifier 10.1109/JMEMS.2005.846358
(S-05-48) Prototype development for chip-chip interconnection by multimode waveguide
Pong, B.L.S.; Pamidigantham, R.; Premachandran, C.S.;
Electronic Packaging Technology Conference, 2005. EPTC 2005. Proceedings of 7th
Volume 2, 7-9 Dec. 2005 Page(s):4 pp.
Digital Object Identifier 10.1109/EPTC.2005.1614453
(S-05-49) Development of a monolithic total internal reflection-based biochip utilizing a microprism array for fluorescence sensing
Shih-Hao Huang and Fan-Gang Tseng
J. Micromech. Microeng. 15 No 12 (December 2005) 2235-2242
(S-05-50) Single mode solid state distributed feedback dye laser fabricated by gray scale electron beam lithography on a dye doped SU-8 resist
S Balslev, T Rasmussen, P Shi and A Kristensen
J. Micromech. Microeng. 15 No 12 (December 2005) 2456-2460
(S-05-51) Manufacturing tolerances for UV LIGA using SU-8 resist
Ronald A Lawes
J. Micromech. Microeng. 15 No 11 (November 2005) 2198-2203
(S-05-52) Improved adhesion in hybrid Si-polymer MEMS via micromechanical interlocking
M P Larsson, R R A Syms and A G Wojcik
J. Micromech. Microeng. 15 No 11 (November 2005) 2074-2082
(S-05-53) Fabrication of 3D polymer microstructures using electron beam lithography and nanoimprinting technologies
Kuo-Shen Chen, I-Kuan Lin and Fu-Hsang Ko
J. Micromech. Microeng. 15 No 10 (October 2005) 1894-1903
(S-05-54) SU-8 Ka-band filter and its microfabrication
K Jiang, M J Lancaster, I Llamas-Garro and P Jin
J. Micromech. Microeng. 15 No 8 (August 2005) 1522-1526
(S-05-55) The fabrication and test of a square prism shaped dye micro laser based on the SU-8 molding process
Yigui Li, Jinquan Liu and Susumu Sugiyama
J. Micromech. Microeng. 15 No 8 (August 2005) 1571-1575
(S-05-56) Multi-layer SU-8 lift-off technology for microfluidic devices
Benjamin Bohl, Reinhard Steger, Roland Zengerle and Peter Koltay
J. Micromech. Microeng. 15 No 6 (June 2005) 1125-1130
(S-05-57) Two-photon lithography of nanorods in SU-8 photoresist
Saulius Juodkazis, Vygantas Mizeikis, Kock Khuen Seet, Masafumi Miwa and Hiroaki Misawa
Nanotechnology 16 No 6 (June 2005) 846-849
(S-05-58) Ultra-deep x-ray lithography of densely packed SU-8 features: II. Process performance as a function of dose, feature height and post exposure bake temperature
Charles Becnel, Yohannes Desta and Kevin Kelly
J. Micromech. Microeng. 15 No 6 (June 2005) 1249-1259
(S-05-59) The development of a microgripper with a perturbation-based configuration design method
Hyeun-Seok Choi, Dong-Chan Lee, Seung-Soo Kim and Chang-Soo Han
J. Micromech. Microeng. 15 No 6 (June 2005) 1327-1333
(S-05-60) Reinforcement of PDMS masters using SU-8 truss structures
Amitha Govindaraju, Anirban Chakraborty and Cheng Luo
J. Micromech. Microeng. 15 No 6 (June 2005) 1303-1309
(S-05-61) Ultra-deep x-ray lithography of densely packed SU-8 features: I. An SU-8 casting procedure to obtain uniform solvent content with accompanying experimental results
Charles Becnel, Yohannes Desta and Kevin Kelly
J. Micromech. Microeng. 15 No 6 (June 2005) 1242-1248
(S-05-62) Specification of mechanical support structures to prevent SU-8 stiction in high aspect ratio structures
K D Vora, B Y Shew, E C Harvey, J P Hayes and A G Peele
J. Micromech. Microeng. 15 No 5 (May 2005) 978-983
(S-05-63) X-ray micromachining SU-8 resist for a terahertz photonic filter
Bor-Yuan Shew, Han-Chieh Li, Ci-Ling Pan and Cheng-Hao Ko
J. Phys. D: Appl. Phys. 38 No 7 (7 April 2005) 1097-1103
(S-05-64) Scum-free patterning of SU-8 resist for electroforming applications
M Agarwal, R A Gunasekaran, P Coane and K Varahramyan
J. Micromech. Microeng. 15 No 1 (January 2005) 130-135
(S-05-65) Uncrosslinked SU-8 as a sacrificial material
Charles Chung and Mark Allen
J. Micromech. Microeng. 15 No 1 (January 2005) N1-N5
2004
(S-04-1) Microaccelerometers Using Cured SU-8 as Structural Material
Seok Jae Jeong and Wanjun Wang
Louisiana State University Baton Rouge, LA 70803, USA
MEMS/MOEMS Components and Their Applications
Proc. SPIE 5344, 115 (2004)
(S-04-2) Low-stressed high-aspect-ratio ultrathick SU-8 UV-LIGA process for the fabrication of a micro heat exchanger
Bo Li and Quanfang Chen
Proc. SPIE 5344, 147 (2004)
(S-04-3) Fabrication of out-of-plane SU-8 refractive microlens using direct lithography method
Ren Yang and Wanjun Wang
Proc. SPIE 5346, 151 (2004)
(S-04-4) Microphotonic systems utilizing SU-8
Raymond C. Rumpf and Eric G. Johnson
Proc. SPIE 5346, 64 (2004)
(S-04-5) Novel low-temperature CMOS-compatible full-wafer-bonding process for the fabrication of 3D embedded microchannels using SU-8
Francisco J. Blanco, Maria Agirregabiria, Maria Tijero, Javier Berganzo, Jorge Garcia, Maria Arroyo, Jesus M. Ruano, Inigo Aramburu, and Kepa Mayora
Proc. SPIE 5276, 131 (2004)
(S-04-6) Patterning of SU-8 resist structures using CF4
Kaushal D. Vora, Anthony S. Holland, Muralidhar K. Ghantasala, and Arnan Mitchell
Proc. SPIE 5276, 162 (2004)
(S-04-7) Dry release of polymer structures with anti-sticking layer
M. C. Cheng, A. P. Gadre, J. A. Garra, A. J. Nijdam, C. Luo, T. W. Schneider, R. C. White, J. F. Currie, and M. Paranjape
J. Vac. Sci. Technol. A 22, 837 (2004)
(S-04-8) Design and test of a microfabricated SU-8 optical scanner
Wei-Chih Wang and Reynold R. Panergo
Proc. SPIE 5394, 280 (2004)
(S-04-9) An SU-8 liquid cell for surface acoustic wave biosensors
Laurent A. Francis, Jean-Michel Friedt, Carmen Bartic, and Andrew Campitelli
Proc. SPIE 5455, 353 (2004)
(S-04-10) Study on the postbaking process and the effects on UV lithography of high aspect ratio SU-8 microstructures
John D. Williams and Wanjun Wang
J. Microlithogr. Microfabrication, Microsyst. 3, 563 (2004)
(S-04-11) Ultrathick SU-8 fabrication for microreciprocating engines
Peng Jin, Kyle Jiang, and Nianjun Sun
J. Microlithogr. Microfabrication, Microsyst. 3, 569 (2004)
(S-04-12) C-MEMS for the Manufacture of 3D Microbatteries
Chunlei Wang, Lili Taherabadi, Guangyao Jia, Marc Madou, Yuting Yeh, and Bruce Dunn
Electrochem. Solid-State Lett. 7, A435 (2004)
(S-04-13) Polymer-based lab-on-a-chip lasers
A. Kristensen, S. Balslev, B. Bilenberg, M. Gersborg-Hansen, and D. Nilsson
Proc. SPIE 5591, 64 (2004)
(S-04-14) Neural Guidance by Open-Top SU-8 Microfluidic Channel
Yi-Chung Lo; Chia-Sheng Huang; Wensyang Hsu; Chaoen Wang;
MEMS, NANO and Smart Systems, 2004. ICMENS 2004. Proceedings. 2004 International Conference on
25-27 Aug. 2004 Page(s):671 - 674
(S-04-15) Characterization of low-temperature SU-8 photoresist processing for MEMS applications
Sang Jeen Hong; Seungkeun Choi; Yoonsu Choi; Allen, M.; May, G.S.;
Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop
4-6 May 2004 Page(s):404 - 408
(S-04-16) A silicon-based bulk micro-machined microelectrode biosensor with SU-8 micro reaction pool
Jingwei Liu; Shanhong Xia; Jinghong Han; Chao Bian; Shaofeng Chen;
Information Acquisition, 2004. Proceedings. International Conference on
21-25 June 2004 Page(s):199 - 204
(S-04-17) Packaging of devices for topside cooling by replacing air-bridges with Su-8 polymer bridges [MESFET example]
Wright, J.I.; Fillion, R.; Meyer, L.; Shaddock, D.;
Advanced Packaging Materials: Processes, Properties and Interfaces, 2004. Proceedings. 9th International Symposium on; 2004 Page(s):63 - 68
(S-04-18) Integrated optical Mach-Zehnder on SU-8 polymer for designing thermal sensors
Pelletier, N.; Beche, B.; Camberlein, L.; Gaviot, E.; Giordani, N.; Zyss, J.;
Sensors, 2004. Proceedings of IEEE24-27 Oct. 2004 Page(s):868 - 871 vol.2
(S-04-19) Polymeric microcombustors for solid-phase conductive fuels
Yanzhu Zhao; English, B.A.; Yoonsu Choi; DiBiaso, H.; Guang, Yuan.; Allen, M.G.;
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
2004 Page(s):498 - 501
(S-04-20) Fully integrated optical system for lab-on-a-chip applications
Balslev, S.; Bilenberg, B.; Geschke, O.; Jorgensen, A.M.; Kristensen, A.; Kutter, J.P.; Mogensen, K.B.; Snakenborg, D.;
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
2004 Page(s):89 - 92
(S-04-21) Flexible optical waveguide film fabrications and optoelectronic devices integration for fully embedded board-level optical interconnects
Choi, C.; Lin, L.; Yujie Liu; Jinho Choi; Li Wang; Haas, D.; Magera, J.; Chen, R.T.;
Lightwave Technology, Journal of; Volume 22, Issue 9, Sept. 2004 Page(s):2168 - 2176
(S-04-22) Fiber attachment for waveguide based devices using V-grooves made in silicon
Istrate, G.; Kusko, M.; Podaru, C.; Manea, E.; Schiopip, P.;
Semiconductor Conference, 2004. CAS 2004 Proceedings. 2004 International
Volume 1, 4-6 Oct. 2004 Page(s):
(S-04-23) Fabrication of microfluidic chip and its application
Du Liqun; Liu Chong; Luo Yi; Lou Zhifeng; Chu Denan; Wen Min; Chen Rong;
Micro-Nanomechatronics and Human Science, 2004 and The Fourth Symposium Micro-Nanomechatronics for Information-Based Society, 2004. Proceedings of the 2004 International Symposium on
31 Oct.-3 Nov. 2004 Page(s):237 - 242
(S-04-24) Wafer-level-package for Bulk Acoustic Wave (BAW) filters
Franosch, M.; Oppermann, K.-G.; Meckes, A.; Nessler, W.; Aigner, R.;
Microwave Symposium Digest, 2004 IEEE MTT-S International
Volume 2, 6-11 June 2004 Page(s):493 - 496 Vol.2
(S-04-25) Fabrication of the 3-D SU-8 fine micromesh and electroplated Ni micromesh structures
Sato, H.; Houshi, Y.; Otsuka, T.; Shoji, S.;
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Oct. 27-29, 2004 Page(s):304 - 305
(S-04-26) Fabrication of silicon-based bulk micro-machined amperometric microelectrode biosensor
Jingwei Liu; Jinghong Han; Shanhong Xia; Chao Bian; Yuanyuan Xu; Shaofeng Chen;
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International
Conference onVolume 3, 18-21 Oct. 2004 Page(s):1784 - 1787 vol.3
Digital Object Identifier 10.1109/ICSICT.2004.1435179
(S-04-27) Integration of microfluidic channels and optical waveguides using low-cost polymer microfabrication techniques
Mitchell, A.; Holland, A.; Vora, K.; Ghantasala, M.K.;
Biophotonics/Optical Interconnects and VLSI Photonics/WBM Microcavities, 2004 Digest of the LEOS Summer Topical Meetings
28-30 June 2004 Page(s):2 pp. Digital Object Identifier 10.1109/LEOSST.2004.1338655
(S-04-28) High-resolution patterning and transfer of thin PDMS films: fabrication of hybrid self-sealing 3D microfluidic systems
Kloter, U.; Schmid, H.; Wolf, H.; Michel, B.; Juncker, D.;
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
2004 Page(s):745 - 748 Digital Object Identifier 10.1109/MEMS.2004.1290692
(S-04-29) High-aspect-ratio tapered structures using an integrated lens technique
Jung-Hwan Park; Yong-Kyu Yoon; Prausnitz, M.R.; Allen, M.G.;
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
2004 Page(s):383 - 386 Digital Object Identifier 10.1109/MEMS.2004.1290602
(S-04-30) Microchip flow cytometer with integrated polymer optical elements for measurement of scattered light
Wang, Z.; El-Ali, J.; Perch-Nielsen, I.R.; Mogensen, K.B.; Snakenborg, D.; Kutter, J.P.; Wolff, A.;
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
2004 Page(s):367 - 370 Digital Object Identifier 10.1109/MEMS.2004.1290598
(S-04-31) Rendering SU-8 hydrophilic to facilitate use in micro channel fabrication
Maria Nordström, Rodolphe Marie, Montserrat Calleja and Anja Boisen
J. Micromech. Microeng. 14 No 12 (December 2004) 1614-1617
(S-04-32) Building embedded microchannels using a single layered SU-8, and determining Young's modulus using a laser acoustic technique
Hui Yu, Oluwaseyi Balogun, Biao Li, Todd W Murray and Xin Zhang
J. Micromech. Microeng. 14 No 11 (November 2004) 1576-1584
(S-04-33) The use of high aspect ratio photoresist (SU-8) for super-hydrophobic pattern prototyping
Neil J Shirtcliffe, Sanaa Aqil, Carl Evans, Glen McHale, Michael I Newton, Carole C Perry and Paul Roach
J. Micromech. Microeng. 14 No 10 (October 2004) 1384-1389
(S-04-34) A rapid micro-mixer/reactor based on arrays of spatially impinging micro-jets
Ren Yang, John D Williams and Wanjun Wang
J. Micromech. Microeng. 14 No 10 (October 2004) 1345-1351
(S-04-35) Microstructuring characteristics of a chemically amplified photoresist synthesized for ultra-thick UV-LIGA applications
Chii-Rong Yang, Gen-Wen Hsieh, Yu-Sheng Hsieh and Yu-Der Lee
J. Micromech. Microeng. 14 No 8 (August 2004) 1126-1134
(S-04-36) Fabrication of an SU-8 based microfluidic reactor on a PEEK substrate sealed by a 'flexible semi-solid transfer'(FST) process
Yujun Song, Challa S S R Kumar and Josef Hormes
J. Micromech. Microeng. 14 No 7 (July 2004) 932-940
(S-04-37) A polymeric microgripper with integrated thermal actuators
Nam-Trung Nguyen, Soon-Seng Ho and Cassandra Lee-Ngo Low
J. Micromech. Microeng. 14 No 7 (July 2004) 969-974
(S-04-38) Novel three-dimensional embedded SU-8 microchannels fabricated using a low temperature full wafer adhesive bonding
F J Blanco, M Agirregabiria, J Garcia, J Berganzo, M Tijero, M T Arroyo, J M Ruano, I Aramburu and Kepa Mayora
J. Micromech. Microeng. 14 No 7 (July 2004) 1047-1056
(S-04-39) PMMA to SU-8 bonding for polymer based lab-on-a-chip systems with integrated optics
B Bilenberg, T Nielsen, B Clausen and A Kristensen
J. Micromech. Microeng. 14 No 6 (June 2004) 814-818
(S-04-40) Integrated microfluidics based on multi-layered SU-8 for mass spectrometry analysis
J Carlier, S Arscott, V Thomy, J C Fourrier, F Caron, J C Camart, C Druon and P Tabourier
J. Micromech. Microeng. 14 No 4 (April 2004) 619-624
(S-04-41) A tapered hollow metallic microneedle array using backside exposure of SU-8
Kabseog Kim, Daniel S Park, Hong M Lu, Wooseong Che, Kyunghwan Kim, Jeong-Bong Lee and Chong H Ahn
J. Micromech. Microeng. 14 No 4 (April 2004) 597-603
(S-04-42) Oxygen quenching effect in ultra-deep x-ray lithography with SU-8 resist
Bor-Yuan Shew, Tai-Yuan Huang, Kun-Pei Liu and Chang-Pin Chou
J. Micromech. Microeng. 14 No 3 (March 2004) 410-414
(S-04-43) Experimental investigation of an embedded root method for stripping SU-8 photoresist in the UV-LIGA process
Chien-Hung Ho and Wensyang Hsu
J. Micromech. Microeng. 14 No 3 (March 2004) 356-364
(S-04-44) A mould-and-transfer technology for fabricating scanning probe microscopy probes
Jun Zou, Xuefeng Wang, David Bullen, Kee Ryu, Chang Liu and Chad A Mirkin
J. Micromech. Microeng. 14 No 2 (February 2004) 204-211
(S-04-45) Polymer embossing tools for rapid prototyping of plastic microfluidic devices
Jagannathan Narasimhan and Ian Papautsky
J. Micromech. Microeng. 14 No 1 (January 2004)96-103
(S-04-46) Wafer-Level Bonding of MEMS Structures with SU-8 Epoxy Photoresist
Santeri Tuomikoski and Sami Franssila
Phys. Scr. 2004 No T114 (2004) 223-226
(S-04-47) Micro check valves for integration into polymeric microfluidic devices
N-T Nguyen, T-Q Truong, K-K Wong, S-S Ho and C L-N Low
J. Micromech. Microeng. 14 No 1 (January 2004) 69-75
2003
(S-03-1) BIOSENSOR BASED ON SU-8 CANTILEVER BY USING THE ELECTROSPRAY DEPOSITION OF PROTEINS
J.W. Kim, Y. Yamagata, B.J. Kim, S. Takeuchi, and T. Higuchi The University of Tokyo
7th lnternational Conference on Miniaturized Chemical and Blochemlcal Analysts Systems October 5-9, 2003, Squaw Valley, CA USA
(S-03-2) Accurate Double-Height Micromolding Method for Three-Dimensional PolyDiMethylSiloxane Structures
Matthieu Denoual, Laurent Griscom, Hiroshi Toshiyoshi, and Hiroyuki Fujita
University of Tokyo, Japan ENS de Cachan Antenne de Bretagne, France
Jap J App Phys, 1: Reg Papers, Short Notes & Rev Papers -7/03- Vol 42, 7A, pp.4598-4601
(S-03-3) Rapid fabrication of hot embossing tools using PDMS
Jagannathan Narasimhan and Ian Papautsky
Proc. SPIE 4982, 110 (2003)
(S-03-4) Molded multilevel modular microfluidic devices
Flavio Aristone, Proyag Datta, Yohannes M. Desta, Alexey M. Espindola, and Jost Goettert
Proc. SPIE 4982, 65 (2003)
(S-03-5) Microfabrication of ultra-thick SU-8 photoresist for microengines
Peng Jin, Kyle C. Jiang, and Nianjun Sun Proc. SPIE 4979, 105 (2003)
(S-03-6) Thick SU-8 photolithography for BioMEMS
Marc Rabarot, Jacqueline Bablet, Marine Ruty, Matthieu Kipp, Isabelle Chartier, and Christophe Dubarry Proc. SPIE 4979, 382 (2003)
(S-03-7) SU-8 based deep x-ray lithography/LIGA
Linke Jian et al. Proc. SPIE 4979, 394 (2003)
(S-03-8) Characterization of SU-8 as a photoresist for electron-beam lithography
Arun K. Nallani, Sang Won Park, and Jeong Bong Lee Proc. SPIE 5116, 414 (2003)
(S-03-9) Deep Dry Etching of Quartz Plate Over 100 µm in Depth Employing Ultra-Thick Photoresist (SU-8)
Takayuki Fukasawa and Yasuhiro Horiike Jpn. J. Appl. Phys., Part 1 42, 3702 (2003)
(S-03-10) Challenges of processing thick and ultrathick photoresist films
Mike Kubenz, Ute Ostrzinski, Freimut Reuther, and Gabi Gruetzner
Proc. SPIE 5039, 1272 (2003)
(S-03-11) Electron-beam lithography for thick refractive optical elements in SU-8
Eric A. Shields, Fred Williamson, and James R. Leger
J. Vac. Sci. Technol. B 21, 1453 (2003)
(S-03-12) High-resolution pattern generation using the epoxy novolak SU-8 2000 resist by electron beam lithography
Mirwais Aktary, Martin O. Jensen, Kenneth L. Westra, Michael J. Brett, and Mark R. Freeman
J. Vac. Sci. Technol. B 21, L5 (2003)
(S-03-13) Development of a microfabricated scanning endoscope using SU-8-based optical waveguide
Wei-Chih Wang, Reynold R. Panergo, and Per G. Reinhall
Proc. SPIE 5047, 305 (2003)
(S-03-14) Fabrication of optical structures using SU-8 photoresist and chemically assisted ion beam etching
Lin Pang, Wataru Nakagawa, and Yeshaiahu Fainman
Opt. Eng. 42, 2912 (2003)
(S-03-15) Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist
Jaekul Lee, Hyunjung Shin, Sungdong Kim, Seungbum Hong, Juhwan Chung, Hongsik Park, and Jooho Moon
Jpn. J. Appl. Phys., Part 2 42, L1171 (2003)
(S-0-16) SU-8 as an electron beam lithography resist
Williamson, F.; Shields, E.A.;
University/Government/Industry Microelectronics Symposium, 2003. Proceedings of the 15th Biennial
30 June-2 July 2003 Page(s):57 - 60
(S-03-17) Controlling the feature size made by two-photon photopolymerization in a threshold material
Ting-Wei Chang; Hong-Yao Mong; Jiunn-Yuan Lin; Jyhpyng Wang; Chau-Hwang Lee;
Lasers and Electro-Optics, 2003. CLEO '03. Conference on
1-6 June 2003 Page(s):2 pp.
(S-03-18) Microneedles array for fluid extraction and drug delivery
Ran Liu; Xiaohao Wang; Zhaoying Zhou; Williams, J.D.;
Micromechatronics and Human Science, 2003. MHS 2003. Proceedings of 2003 International Symposium on
19-22 Oct. 2003 Page(s):239 – 244
(S-03-19) Integrated polymer waveguides for absorbance detection in chemical analysis systems
Mogensen, K.B.; El-Ali, J.; Wolff, A.; Kutter, J.P.;
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003 Volume 1, 8-12 June 2003 Page(s):694 - 697 vol.1
(S-03-20) Integrated vertical screen microfilter system using inclined SU-8 structures
Yong-Kyu Yoon; Jung-Hwan Park; Cros, F.; Allen, M.G.;
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on 19-23 Jan. 2003 Page(s):227 – 230
(S-03-21) A novel fabrication of in-channel 3-D micromesh structure using maskless multi-angle exposure and its microfilter application
Sato, H.; Kakinuma, T.; Jeung Sang Go; Shoji, S.;
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on 19-23 Jan. 2003 Page(s):223 - 226
(S-03-22) Fabrication of 3D microstructures with inclined/rotated UV lithography
Han, M.; Woonseob Lee; Sung-Keun Lee; Lee, S.S.;
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on 19-23 Jan. 2003 Page(s):554 - 557
(S-03-23) Mechanical strength and interfacial failure analysis of cantilevered SU-8 microposts
H S Khoo, K-K Liu and F-G Tseng
J. Micromech. Microeng. 13 No 6 (November 2003) 822-831
(S-03-24) Use of a photoresist sacrificial layer with SU-8 electroplating mould in MEMS fabrication
I-H Song and P K Ajmera
J. Micromech. Microeng. 13 No 6 (November 2003) 816-821
(S-03-25) Fabrication of micronozzles using low-temperature wafer-level bonding with SU-8
S Li, C B Freidhoff, R M Young and R Ghodssi
J. Micromech. Microeng. 13 No 5 (September 2003) 732-738
(S-03-26) High resolution x-ray micromachining using SU-8 resist
B-Y Shew, J-T Hung, T-Y Huang, K-P Liu and C-P Chou
J. Micromech. Microeng. 13 No 5 (September 2003) 708-713
(S-03-27) Characterization of masking materials for deep glass micromachining
D C S Bien, P V Rainey, S J N Mitchell and H S Gamble
J. Micromech. Microeng. 13 No 4 (July 2003)S34-S40
(S-03-28) Tapered LIGA HARMs
R Turner, Y Desta, K Kelly, J Zhang, E Geiger, S Cortez and D C Mancini
J. Micromech. Microeng. 13 No 3 (May 2003)367-372
(S-03-29) Chemical bonding of multiwalled carbon nanotubes to SU-8 via ultrasonic irradiation
Nanyan Zhang, Jining Xie, Manton Guers and Vijay K Varadan
Smart Mater. Struct. 12 No 2 (April 2003) 260-263
(S-03-30) Fabrication and characterization of an SU-8 gripper actuated by a shape memory alloy thin film
I Roch, Ph Bidaud, D Collard and L Buchaillot
J. Micromech. Microeng. 13 No 2 (March 2003) 330-336
(S-03-31) A micro-cavity fluidic dye laser
B Helbo, A Kristensen and A Menon
J. Micromech. Microeng. 13 No 2 (March 2003) 307-311
2002
(S-02-1) Pyrolysis of Negative Photoresists to Fabricate Carbon Structures for Microelectromechanical Systems and Electrochemical Applications
Amit Singh, Jaishankar Jayaram, Marc Madou, and Sheikh Akbar
J. Electrochem. Soc. 149, E78 (2002)
(S-02-2) Process and realization of a three-dimensional gold electroplated antenna on a flexible epoxy film for wireless micromotion system
Philippe Basset, Andreas Kaiser, Dominique Collard, and Lionel Buchaillot
J. Vac. Sci. Technol. B 20, 1465 (2002)
(S-02-3) Ultra-thick lithography for advanced packaging and MEMS
Chad Brubaker, Rafiqul Islam, and Helge Luesebrink Proc. SPIE 4690, 270 (2002)
(S-02-4) Novel device of passive and fixed alignment of optical fiber using SU-8 photoresist
Jingquan Liu, Bingchu Cai, Jun Zhu, Di Chen, Yigui Li, Jiliang Zhang, Guipu Ding, Xiaolin Zhao, and Chunsheng Yang Proc. SPIE 4928, 1 (2002)
(S-02-5) Microgripper for handling and assembly in MEMS produced by SU-8 technology
Dragan Petrovic, Gordana Popovic, Tatjana Petrovic, Andreas Schneider, Ejaz Huq, Helmut Detter, and Friedrich Franek Proc. SPIE 4928, 63 (2002)
(S-02-6) SU-8 based piezoresistive mechanical sensor
Thaysen, J.; Yalcinkaya, A.; Vestergaard, R.; Jensen, S.; Mortensen, M.; Vettiger, P.; Menon, A.;
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
20-24 Jan. 2002 Page(s):320 – 323
(S-02-7) A high sensitive Fabry-Perot shear stress sensor employing flexible membrane and double SU-8 structures
Fan-Gang Tseng; Chun-Jun Lin;
Sensors, 2002. Proceedings of IEEE
Volume 2, 12-14 June 2002 Page(s):969 - 972 vol.2
(S-02-8) Continuously-varying, three-dimensional SU-8 structures: fabrication of inclined magnetic actuators
Yoonsu Choi; Kieun Kim; Allen, M.G.;
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
20-24 Jan. 2002 Page(s):176 – 179
(S-02-9) Fabrication of high-aspect-ratio PZT thick film structure using sol-gel technique and SU-8 photoresist
Futai, N.; Matsumoto, K.; Shimoyama, I.;
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
20-24 Jan. 2002 Page(s):168 – 171
(S-02-10) Direct coupling of VCSELs to plastic optical fibers using guide holes patterned in a thick photoresist
Ouchi, T.; Imada, A.; Sato, T.; Sakata, H.;
Photonics Technology Letters, IEEE
Volume 14, Issue 3, March 2002 Page(s):263 – 265
(S-02-11) Development of low loss organic-micromachined interconnects on silicon at microwave frequencies
Newlin, D.P.; Pham, A.-V.H.; Harriss, J.E.;
Components and Packaging Technologies, IEEE Transactions on [see also Components, Packaging and Manufacturing Technology, Part A: Packaging Technologies, IEEE Transactions on]
Volume 25, Issue 3, Sept. 2002 Page(s):506 – 510
(S-02-12) A surface-tension driven micropump for low-voltage and low-power operations
Kwang-Seok Yun; Il-Joo Cho; Jong-Uk Bu; Chang-Jin Kim; Euisik Yoon;
Microelectromechanical Systems, Journal of
Volume 11, Issue 5, Oct. 2002 Page(s):454 – 461
(S-02-13) Development of RF/microwave on-chip inductors using an organic micromachining process
Ramachandran, R.; Pham, A.-V.H.;
Advanced Packaging, IEEE Transactions on [see also Components, Packaging and Manufacturing Technology, Part B: Advanced Packaging, IEEE Transactions on]
Volume 25, Issue 2, May 2002 Page(s):244 – 247
(S-02-14) Polymer-based stress sensor with integrated readout
J Thaysen, A D Yalçinkaya, P Vettiger and A Menon
J. Phys. D: Appl. Phys. 35 No 21 (7 November 2002) 2698-2703
(S-02-15) A low-temperature wafer bonding technique using patternable materials
C-T Pan, H Yang, S-C Shen, M-C Chou and H-P Chou
J. Micromech. Microeng. 12 No 5 (September 2002) 611-615
(S-02-16) A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist
C-H Lin, G-B Lee, B-W Chang and G-L Chang
J. Micromech. Microeng. 12 No 5 (September 2002) 590-597
(S-02-17) Determining local residual strains of polydimethylsiloxane using ink dots, and stiffening polydimethylsiloxane using SU-8 particles
C Luo, J Garra, T W Schneider, R White, J Currie and M Paranjape
J. Micromech. Microeng. 12 No 5 (September 2002) 677-681
(S-02-18) Thick photoresist development for the fabrication of high aspect ratio magnetic coils
M Brunet, T O'Donnell, J O'Brien, P McCloskey and S C Ó Mathuna
J. Micromech. Microeng. 12 No 4 (July 2002)444-449
(S-02-19) SU-8 thick photoresist processing as a functional material for MEMS applications
E H Conradie and D F Moore
J. Micromech. Microeng. 12 No 4 (July 2002) 368-374
(S-02-20) Micro-channel filling flow considering surface tension effect
D S Kim, K-C Lee, T H Kwon and S S Lee
J. Micromech. Microeng. 12 No 3 (May 2002) 236-246
(S-02-21) New formation technology for a plasma display panel barrier-rib structure using a precise metal mold fabricated by the UV-LIGA process
S-H Son, Y-S Park and S-Y Choi
J. Micromech. Microeng. 12 No 1 (January 2002) 63-69
2001
(S-01-1) Microfabrication technology for waveguide components at submillimeter wavelengths
James G. Partridge and Steven R. Davies Proc. SPIE 4236, 149 (2001)
(S-01-2) Profile control of SU-8 photoresist using different radiation sources
Zheng Cui, Derek W. Jenkins, Andreas Schneider, and Geoff McBride
Proc. SPIE 4407, 119 (2001)
(S-01-3) Deep x-ray lithography with the SU-8 resist
Laurence Singleton, Alexei L. Bogdanov, Serguei Peredkov, Oliver Wilhelmi, Andreas Schneider, Carsten Cremers, Stephan Megtert, and Andreas Schmidt
Proc. SPIE 4343, 182 (2001)
(S-01-4) Spin coating properties of SU-8 thick-layer photoresist
Ren-Haw Chen and Chao-Min Cheng Proc. SPIE 4345, 494 (2001)
(S-01-5) Reduction of internal stress in a SU-8-like negative tone photoresist for MEMS applications by chemical modification
Ralf Ruhmann, Gisela Ahrens, Antje Schuetz, Jeanine Voskuhl, and Gabi Gruetzner
Proc. SPIE 4345, 502 (2001)
(S-01-6) Orthogonal method for processing of SU-8 resist in UV-LIGA
Jingquan Liu, Jun Zhu, Guipu Ding, Xiaolin Zhao, and Bingchu Cai
Proc. SPIE 4557, 462 (2001)
(S-01-7) Fabrication of high-aspect-ratio microstructure on metallic substrate using SU-8 resist
Jingquan Liu, Bingchu Cai, Jun Zhu, Guipu Ding, Xiaolin Zhao, Chunsheng Yang, and Di Chen Proc. SPIE 4601, 200 (2001)
(S-01-8) Micromachined optical switch with a vertical SU-8 mirror
Suyan Liu, Minqiang Bu, Xiongying Ye, Zhaoying Zhou, Dacheng Zhang, Ting Li, Yilong Hao, and Zhimin Tan Proc. SPIE 4601, 354 (2001)
(S-01-9) Composite materials for planar frequency agile microwave devices
Mills, J.B.; Stevens, C.J.; Edwards, D.J.;
High Frequency Postgraduate Student Colloquium, 2001. 6th IEEE
9-10 Sept. 2001 Page(s):59 - 64
(S-01-10) Development of low loss organic-micromachined interconnects on silicon at microwave frequencies
Newlin, D.; Pham, A.; Harriss, J.; Lee, J.B.;
Radio and Wireless Conference, 2001. RAWCON 2001. IEEE
19-22 Aug. 2001 Page(s):181 - 183
(S-01-11) An integrated BioMEMS fabrication technology
Gadre, A.; Kastantin, M.; Sheng Li; Ghodssi, R.;
Semiconductor Device Research Symposium, 2001 International
5-7 Dec. 2001 Page(s):186 - 189
(S-01-12) Development of RF/microwave on-chip inductors using an organic micromachining process
Ramachandran, R.; Newlin, D.; Pham, A.;
Electrical Performance of Electronic Packaging, 2001
29-31 Oct. 2001 Page(s):97 - 100
(S-01-13) Simulation and experimental validation of electroosmotic flow in a microfluidic channel
Seungbae Hong; Zhongliang Tang; Djukic, D.; Tucay, A.; Bakhru, S.; Osgood, R.; Yardley, J.; West, A.C.; Modi, V.;
Microelectromechanical Systems Conference, 2001
24-26 Aug. 2001 Page(s):73 - 76
(S-01-14) Soft and rigid two-level microfluidic networks for patterning surfaces
David Juncker, Heinz Schmid, André Bernard, Isabelle Caelen, Bruno Michel, Nico de Rooij and Emmanuel Delamarche
J. Micromech. Microeng. 11 No 5 (September 2001) 532-541
(S-01-15) Advanced photoresist technologies for microsystems
J O'Brien, P J Hughes, M Brunet, B O'Neill, J Alderman, B Lane, A O'Riordan and C O'Driscoll
J. Micromech. Microeng. 11 No 4 (July 2001)353-358
(S-01-16) Micro heat flux sensor using copper electroplating in SU-8 microstructures
Seok Hwan Oh, Kwang-Cheol Lee, Jaechul Chun, Moohwan Kim and Seung S Lee
J. Micromech. Microeng. 11 No 3 (May 2001) 221-225
(S-01-17) Microfluidic systems with on-line UV detection fabricated in photodefinable epoxy
Rebecca J Jackman, Tamara M Floyd, Reza Ghodssi, Martin A Schmidt and Klavs F Jensen
J. Micromech. Microeng. 11 No 3 (May 2001) 263-269
(S-01-18) Patterning, electroplating and removal of SU-8 moulds by excimer laser micromachining
Muralidhar K Ghantasala, Jason P Hayes, Erol C Harvey and Dinesh K Sood
J. Micromech. Microeng. 11 No 2 (March 2001) 133-139
(S-01-19) Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS
J Zhang, K L Tan, G D Hong, L J Yang and H Q Gong
J. Micromech. Microeng. 11 No 1 (January 2001) 20-26
(S-01-20) A novel micro-machining method for the fabrication of thick-film SU-8 embedded micro-channels
Francis E H Tay, J A van Kan, F Watt and W O Choong
J. Micromech. Microeng. 11 No 1 (January 2001) 27-32
(S-01-21) Low-loss polymeric optical waveguides using electron-beam direct writing
(SU-8 2000) W. H. Wong, J. Zhou, and E. Y. B. Puna)
Department of Electronic Engineering, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong
APPLIED PHYSICS LETTERS, VOLUME 78, NUMBER 15 9 APRIL 2001
(S-01-22) Improving the Process Capability of SU-8
M. Shaw, D. Nawrocki, R. Hurditch and D. Johnson
MicroChem Corp., Newton MA, 02464
Proc. SPIE 2438: pp 846-849 (1995)
(S-01-23) Improving the Process Capability of SU-8, Part II
D. W. Johnson, A. Jeffries, D. W. Minsek and R. J. Hurditch
MicroChem Corp., 90 Oak St., Newton, MA, 02464
2000
(S-00-1) Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters
Zhong G. Ling, Kun Lian, and Linke Jian Proc. SPIE 3999, 1019 (2000)
(S-00-2) SU-8 negative photoresist for optical mask manufacturing
Alexei L. Bogdanov Proc. SPIE 3999, 1215 (2000)
(S-00-3) Process characterization of an ultrathick strippable photoresist using a broadband stepper
Warren W. Flack, Scott Kulas, and David W. Minsek Proc. SPIE 3999, 478 (2000)
(S-00-4) Rapid tooling using SU-8 for injection molding microfluidic components
Thayne L. Edwards, Swomitra K. Mohanty, Russel K. Edwards, Charles L. Thomas, and A. Bruno Frazier Proc. SPIE 4177, 75 (2000)
(S-00-5) High-aspect-ratio microstructure fabrication using SU-8 resist
Jun Zhu, Xiaolin Zhao, and Zhiping Ni Proc. SPIE 4174, 86 (2000)
(S-00-6) LIGA technology today and its industrial applications
Song-Jo Chung, Herbert Hein, Juergen Mohr, Franz J. Pantenburg, Joachim Schulz, and Ulrike Wallrabe Proc. SPIE 4194, 44 (2000)
(S-00-7) Thick-layer resists for surface micromachining
Bernd Loechel J. Micromech. Microeng. 10 No 2 (June 2000) 108-115
1999
(S-99-1) Fabrication of three-dimensional microfluidic systems by stacking molded polydimethylsiloxane (PDMS) layers
Byung-Ho Jo and David J. Beebe Proc. SPIE 3877, 222 (1999)
(S-99-2) Terahertz time-domain spectroscopy of films fabricated from SU-8
S. Arscott, F. Garet, P. Mounaix, L. Duvillaret, J.-L. Coutaz, and D. Lippens
Electron. Lett. 35, 243 (1999)
(S-99-3) Excimer laser micromachining of structures using SU-8
Muralihar K. Ghantasala, Erol C. Harvey, and Dinesh K. Sood
Proc. SPIE 3874, 85 (1999)
(S-99-4) Electric Impedence spectroscopy using microchannels with integrated metal electrodes, H. E. Ayliffe, A.B. Frazier, R.D. Rabbitt, IEEE Journal of Microelectromechanical systems, Vol. 8, No. 1, March 1999, pp. 50-57
(S-99-5) Miniaturized detectors fabricated using Si and Epon SU8, D.J. Strike et al, TRANSDUCERS'99, Sendai-Japan, (1999)
(S-99-6) 3D microfabrication by combining microstereolithography and thick resist UV lithography, A. Bertsch et al, Sensors and Actuators A, 73, (1999), pp. 14-23
(S-99-7) UV-LIGA Process for High Aspect Ratio Structures Using Stress Barriers and C-shaped Etch Holes, H.-K. Chang et alTransducers'99, Sendai-Japan, (1999)
1998
(S-98-1) SU8 photoepoxy : A new material for FPD and PDP applications, L. Guerin, C.W. Newquist, P. Renaud, DISPLAY WORKS'98, San Jose, (1998)
(S-98-2) High aspect ratio planar coils embedded in SU8 photoepoxy for MEMS applications,
L. Guerin, A. Torosdagi, P. Eichenberger, P. Renaud, EUROSENSORS XII, Southampton, (1998)
(S-98-3) Photo-polymer microchannel technologies and applications, P. Renaud, H van Lintel, M. Heuschkel, L. Guerin, µTAS'98, Banff, Alberta, 1998, pp. 17-22
(S-98-4) Microfluidic systems fabrication by lamination of photoplastic (SU8)films, L. Guerin, A. Torosdagi, M. Heuschkel, P. Renaud, NANOTECH'98, Montreux, Switzerland, (1998)
(S-98-5) Rapid prototyping of microfluidic systems in Poly(dimethylsiloxane), D.C. Duffy, J.C. McDonald, O.J.A. Schueller, G. Whitesides, Anal. Chem., Vol. 70, (1998), pp. 4974-4984
(S-98-6) The optimization of ultra-thick photoresist films, W.W. Flack, W.P. Fan, S. White, SPIE 1998 #3333-67
(S-98-7) High performance micromachined Sm2Co17 bonded magnets, B.M. Dutoit, P.A. Besse, H. Blanchard, L. Guerin, R.S. Popovic, to be published in Sensors and Actuators A77 1998
(S-98-8) Improvements and recent advances in nanocomposite capacitors using a colloidal technique, V. Agarwal, P. Chahal, R. Tummala, M.G. Allen, 1998 Electronic Components and Technology Canference, Denver, (1998), pp. 165-170
(S-98-9) The micromachined accelerometer fabrication using thick resist,T. Kawabata, K. Maenaka, Technical digest of the 16th Sensor Symposium, Japan, (1998), pp. 199-202
(S-98-10) Taguchi Optimization for processing EPON SU8 resist, B. Eyre et al., Proceedings MEMS'98, Heidelberg, (1998), pp. 218-222
(S-98-11) Buried microchannels in polymer for delivering of solutions to neurons in a network, M. Heuschkel et al., Sensors and Actuators : B, 48/1-3, (1998), pp. 356-361
1997
(S-97-1) Negative photoresists for optical lithography,
J. M. Shaw, J. D. Gelorme, N. C. LaBianca, W. E. Conley, and S. J. Holmes, IBM Journal of Research and Development, 41(1997), pp. 81-94
(S-97-2) High aspect ratio ultrathick, negative-tone near-UV photoresist for MEMS applications,
M. Despont, H. Lorenz, N.Fahrni, J. Brugger. P. Renaud, and P. Vettiger, MEMS'97, IEEE, Nagoya, (1997), pp. 518-522
(S-97-3) Mechanical charaterization of a new high-aspect-ratio near UV-Photoresist,
H. Lorenz, M. Laudon, P. Renaud MNE'97, Athens, Greece, (1997)
(S-97-4) Simple and low cost fabrication of embedded microchannels by using a new thick-film photoplastic,
L. Guerin, M. Bossel, M. Demierre, S. Calmes, and P. Renaud, Transducers 1997, Chicago, (1997), pp. 1419-1422
(S-97-5) Fabrication process of high-aspect ratio elastic structures for piezoelectric motor applications,
L. Dellmann et al., Transducers'97, Chicago, (1997)
(S-97-6) Terahertz time-domain spectroscopy of films fabricated from SU-8,
S. Arscott, F. Garet, P. Mounaix, L. Duvillaret, J.-L. Coutaz, D. Lippens, Electronics Letters, Vol. 35, No. 3, pp. 243-244
1996 and earlier
(S-96-1) 7. SU8 : A low-cost negative resist for MEMS,
H. Lorenz, M. Despont, N. Fahrni, N. LaBianca, P. Renaud, P. Vettiger, EPON MicroMechanics Europ MME 96, Spain, (1996), pp. 32-35
(S-96-2) High frequency transmission line using micromachined polymer dielectric,
J.R. Thorpe, D.P. Steenson, R.E. Mies, Electronics Letters, Vol. 34, No. 12, pp. 1237-1238
(S-95-1) High aspect ratio resist for thick film applications,
N. LaBianca, and J. Delorme, in Proc. SPIE vol. 2438, SPIE, (1995), pp. 846-852
(S-95-2) High aspect ratio optical resist chemistry for MEMS applications,
N. LaBianca, J. Gelorme, K. Lee, E. Sullivan, and J. Shaw, 4th Int. Symp. on Magnetic Materials, Processes, and Devices, The Electrochem. Soc., 95-18 (1995), pp.386-396
(S-95-3) Micromachining applications for a high resolution ultra-thick photoresist,
K. Lee, N. LaBianca, S. Rishton, and S. Zohlgharnain, J. Vac. Scien. Technol. B, 13(1995), pp. 3012-3016
(S-90-1) Encapsulation of Chemically Sensitive Field-effect Transistors with Photocurable Epoxy Resin,
C. Dumschat et al, Sensors and Actuators B, 2, (1990), pp. 271-276
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