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SU-8 Resists

Ultra Thick high aspect ratio
Encapsultion/Passivation
Microfluidics

The SU-8 product line consists of chemically amplified; epoxy based negative resists with high functionality, high optical transparency and are sensitive to near UV radiation. Cured films or topography are highly resistant to solvents, acids and bases and have excellent thermal stability, making it well suited for permanent use applications.

Material Attributes

SU-8 2000

  • >10:1 aspect ratio imaging with vertical sidewalls.
  • <1um to >200 um in a single spin coat.
  • High chemical and plasma resistance.
  • Faster Drying Films.

SU-8 3000

  • 5:1 aspect ratio imaging with vertical sidewalls.
  • Up to 100 um in a single spin coat.
  • High chemical and plasma resistance.
  • Enhanced adhesion.




SU-8 Photoresists Formulations (pdfs):
> 2-25
> 50-100
> 2000.5 - 2015
> 2025 - 2075
> 2100 - 2150
> 3000

Data Table


SU-8/ SU-8 2000
Frequently Asked Questions


Application Notes