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MicroSpray Photoresist

What is MicroSpray™ .....Photoresist in a spray can!

Microspray™ is based on long proven, mature, novolak technology. It is ideally suited for developmental applications including perforated, 3-dimensional and other substrates that have severe topography, deep V grooves, back side wafer protection or other difficult MEMS features

Gwen Donahue, MEMS Engineer with MicroCHIPS, Inc. says, "I was very pleased with the results of MicroSpray™. The coverage of the 100um sidewalls is exactly what I wanted to see on these wafers and I was unable to get this result using spin on resist."

Harris Miller, R&D Product Mgr for Microspray™, states that "The cost of ownership is of course very low, since no coating equipment is needed."

Product attributes:

  • No coating equipment required
  • Minimal waste
  • Coats over non-planar surfaces
  • Coats irregularly shaped substrates
  • Covers the sidewalls and edges of trenches
  • Produces uniform coatings on perforated substrates

Applications for microSpray:

  • Conformal coatings
  • Backside coatings
  • Protective coatings
  • MEMS devices
  • Decorative etching
  • Prototyping

Now available with our SU-8 formulation.





MicroSpray™ Data Sheet (pdf)

MicroSpray™ Negative Data Sheet (pdf)

MicroSpray™ SU-8 Data Sheet (pdf)

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Application Notes