KMPR® 1000 is a high contrast, i-line sensitive epoxy-based photoresist that can be developed in conventional aqueous alkaline-based developers and readily removed from the substrate.
Material Attributes
- High aspect ratio imaging with vertical sidewalls.
- Up to 100 um in a single spin coat.
- Compatible with standard aqueous alkaline-based developers.
- No cracking.
- Strippable with wet or dry chemistry.
- High chemical and plasma resistance
- Excellent adhesion to metals
- Excellent electrolytic plating bath stability.
