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Ancillaries

MicroChem offers a broad line of ancillary products for resist thinning, edge bead removal, development, rinse and removal of photoresists. These products work effectively with our PMGI, LOR, PMMA & copolymer and SU-8 resists as well as with many other commercially available photoresist products. Competitively priced, these ancillary products and are available in a wide range of package sizes.

Adhesion Promoter/Release Layer
Product name
Product function
  OmniCoat  

Photoresist thinners
Product name
Product function
  SU-8 2000 thinner to dilute SU-8 2000 resists
  T thinner to dilute PMGI SF resists
  G thinner to dilute PMGI and LOR SFG resists
  A thinner to dilute PMMA A resists
  C thinner to dilute PMMA C resists
  EL thinner to dilute copolymer resists

Edge bead remover
Product name
Product function
  EBR PG (pdf) edge bead removal, equipment cleandown

Developers
Product name
Product function
  PMGI 101 developer to selectively develop PMGI resists
  SU-8 developer to develop SU-8 & SU-8 2000 resists
  MIBK:IPA 1:1 (pdf) to develop PMMA & copolymer resists
  MIBK:IPA 1:2 (pdf) to develop PMMA & copolymer resists

Rinse
Product name
Product function
  MIBK:IPA 1:3 (pdf) to rinse PMMA & copolymer resists

Removal
Product name
Product function
  Remover PG (pdf) to strip SU-8, PMGI, LOR & PMMA resists






Application Notes
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