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SU-8 2000 Permanent Epoxy Resists

SU-8 2000 chemically amplified, i-line resists are well-suited for the fabrication of permanent device structures. These negative tone, epoxy based resists exhibit excellent chemical resistance and low Young's Modulus which makes them ideal for fabricating micro/nano structures such as cantilevers, membranes, and microchannels.



Material uses:

  • Fabrication of PDMS molds
  • Structural components such as micro arrays, fluidic channels, display pixel walls and dielectric layers
  • Dry etch masks
  • Rapid prototyping

Material attributes:

  • Spin coat films from <1µm to >75µm
  • High thermal and chemical resistance
  • Optically transparent
  • Compatible with i-line imaging equipment






25 µm wide, 125 µm high
Source: MicroChem
10µm features, 50µm SU-8 2000 coating
Source: Micro Resist Technology

Cantilever

Microfluidic Actuator

Genoletet, al., IBM-Zurich, Rev. Sci.
Instrum., 70, 2398 (1999)
N Chronis, LP Lee, UC Berkeley, μTAS 2002, 754 (2002)


Copyright MicroChem Corp.
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