Products

Ancillaries

MicroChem offers a broad line of ancillary products for resist thinning, edge bead removal, development, rinse and removal of photoresists. These products work effectively with our PMGI, LOR, PMMA & copolymer and SU-8 resists as well as with many other commercially available photoresist products. Competitively priced, these ancillary products are available in a wide range of package sizes.

Adhesion Promoter/Release Layer

Product name
Product function
  OmniCoat Adhesion Promoter
  MCC Primer 80/20 Adhesion Promoter

Photoresist thinners

Product name
Product function
  SU-8 2000 thinner to dilute SU-8 2000 resists
  T thinner to dilute PMGI SF resists
  G thinner to dilute PMGI and LOR SFG resists
  A thinner to dilute PMMA A resists
  C thinner to dilute PMMA C resists
  EL thinner to dilute copolymer resists

Edge bead remover

Product name
Product function
  EBR PG (pdf) edge bead removal, equipment cleanup

Developers

Product name
Product function
  PMGI 101 developer PMGI resist development
  SU-8 developer SU-8 & SU-8 2000 resist development
  MIBK:IPA 1:1 High speed PMMA & copolymer resist development
  MIBK:IPA 1:2 PMMA & copolymer resist development
  MIBK:IPA 1:3 High resolution PMMA & copolymer resist development
  MicroChem 303 A Developer Holographic lithography and general microelectronics
  MicroChem 452 Developer Development of Dow S1800® and other commercially available photoresists
  MicroChem 455 Developer Development of Dow S1800® and other commercially available photoresists

Removal

Product name
Product function
  Remover PG to strip SU-8, PMGI, LOR & PMMA resists
  MicroChem Remover 1112A to strip DNQ/Novolak-based resists








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