Applications > MEMS

Wafer Bonding

Wafer bonding with polymer adhesives is a low cost, simple and robust fabrication process compared to alternative wafer bonding techniques. Polymer adhesive bonding is used in a number of technology spaces include micro-fluidic devices e.g. lab-on-chip applications, CMOS Image sensors, SAW devices, Wafer Level / Chip-Scale Packaging and 3D Interconnect technologies.

Advantages of using a negative tone photoepoxy for liquid adhesive wafer bonding include low bonding temperatures, compatibility with standard IC processing, high resolution features and the ability to join different substrate types.



SU-8: Series Adhesive Advantages

  • High bond strength
  • Low process temperature
  • Low process cost
  • Photo imageable (BB or i-line)
  • High Aspect Ratio (HAR) images
  • Spin-coatable >100µm in a single coat

XP WB Adhesive Advantages

  • High bond strength
  • Low process temperature (<180°C)
  • Void-free bonding at 150°C, 0.58MPa, 30sec.
  • Low process cost
  • Photo imageable (broadband or i-line)
  • <20µm line/space resolution
  • Non-metal (e.g. antimony) PAG


CMOS Image Sensor Cavity. Silicon Substrate, XP WB Adhesive Walls and Glass Cap.

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CMOS Image Sensor Cavity. Silicon Substrate, XP WB Adhesive Walls and Glass Cap.
Cross section post wafer dicing








CMOS Image Sensors

CMOS Image Sensors



SU-8 2000 Micro Cavity (SU-8 walls and roof)

SU-8 2000 Micro Cavity (SU-8 walls and roof)



Cavity Process

Cavity Process



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