Thick film and Nano Imprint Lithography resists from Micro Resist Technology

In addition to handling our own products, MicroChem has been licensed by Micro Resist Technology (MRT) to distribute and support their line of specialty photoresists in North America. Below is a brief description for each product line. For more information about these products please contact our technical sales group or visit the MRT site at www.microresist.de

ma-P 1275 Ideally suited for high pH plating applications

• Film thickness up to 40µm
• i-line sensitive
• High thermal and plasma etch stability
• Etch and plating stability to pH 12

ma-N 400 Ideally suited for evaporative lift-off processing

• Film thickness up to 20µm
• Sidewalls are tunable for lift-off processing
• Aqueous developable
• Plating stability to pH13

ma-N 1400

• Ideally suited for high temperature lift-off processing
• Film thickness from 0.5µm- 2.5µm
• i-line sensitive
• Thermally stable to 170° C
• Compatible with high temperature sputter lift-off processes
• Resist sidewalls are easily tunable for lift-off processing

ma-N2400 E-beam & deep UV resists

• 50nm resolution with e-beam
• High plasma etch stability

		Nano Imprint Lithography Resists

mr-I 7000E/8000E/9000E, mr-UVCur06

• Film thickness from 200-400nm
• Resolution: 50nm lines & spaces (300nm film thickness)
• mr-I 7000E/8000E thermoplastic polymer
• mr-I 9000E thermoset polymer
• mr-UVCur06 UV exposable imprint material

		Ormocers

Advanced materials for optics and lithography

• Ormocore - Core material for planar optical waveguides
• Ormoclad - Cladding material for planar optical waveguides
• Ormocomp - material for micro optical components
• Ormodev - developer for Ormocers